Abstract
Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.
Original language | English |
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Article number | mi5020228 |
Pages (from-to) | 228-238 |
Number of pages | 11 |
Journal | Micromachines |
Volume | 5 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2014 |
Keywords
- Combined-nanoimprint-and-photolithography
- Hybrid mask mold
- Photonic crystals
- TM polarizer
ASJC Scopus subject areas
- Control and Systems Engineering
- Mechanical Engineering
- Electrical and Electronic Engineering