One-step combined-nanolithography-and-photolithography for a 2D photonic crystal TM polarizer

Kyung Hak Choi, Jinwoo Huh, Yonghao Cui, Krutarth Trivedi, Walter Hu, Byeong Kwon Ju, Jeong Bong Lee

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.

Original languageEnglish
Article numbermi5020228
Pages (from-to)228-238
Number of pages11
Issue number2
Publication statusPublished - 2014


  • Combined-nanoimprint-and-photolithography
  • Hybrid mask mold
  • Photonic crystals
  • TM polarizer

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Mechanical Engineering
  • Electrical and Electronic Engineering


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