Optically Patternable Metamaterial below Diffraction Limit

Youngseop Lee, Sang Gil Park, Seokjae Yoo, Minhee Kang, Sang Chul Jeon, Young Su Kim, Q. Han Park, Ki Hun Jeong

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.

Original languageEnglish
Pages (from-to)18405-18409
Number of pages5
JournalACS Applied Materials and Interfaces
Volume9
Issue number22
DOIs
Publication statusPublished - 2017 Jun 7

Bibliographical note

Funding Information:
This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (2015036205, 2016013061) and a grant of the Korea Health Technology R&D Project through the Korea Health Industry Development Institute (KHDI), funded by the Ministry of Health & Welfare, Republic of Korea (HI13C2181).

Publisher Copyright:
© 2017 American Chemical Society.

Keywords

  • meta-photoresist
  • subdiffraction limit
  • superlens effect
  • surface plasmon excitation
  • ultraviolet nanolithography

ASJC Scopus subject areas

  • General Materials Science

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