Optically Patternable Metamaterial below Diffraction Limit

Youngseop Lee; Sang Gil Park; Seokjae Yoo; Minhee Kang; Sang Chul Jeon; Young Su Kim; Q. Han Park; Ki Hun Jeong

doi:10.1021/acsami.7b02940

Optically Patternable Metamaterial below Diffraction Limit

Youngseop Lee, Sang Gil Park, Seokjae Yoo, Minhee Kang, Sang Chul Jeon, Young Su Kim, Q. Han Park, Ki Hun Jeong

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.

Original language	English
Pages (from-to)	18405-18409
Number of pages	5
Journal	ACS Applied Materials and Interfaces
Volume	9
Issue number	22
DOIs	https://doi.org/10.1021/acsami.7b02940
Publication status	Published - 2017 Jun 7

Bibliographical note

Publisher Copyright:
© 2017 American Chemical Society.

Keywords

meta-photoresist
subdiffraction limit
superlens effect
surface plasmon excitation
ultraviolet nanolithography

ASJC Scopus subject areas

General Materials Science

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10.1021/acsami.7b02940

Cite this

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title = "Optically Patternable Metamaterial below Diffraction Limit",

abstract = "We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.",

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language = "English",

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AU - Lee, Youngseop

AU - Park, Sang Gil

AU - Yoo, Seokjae

AU - Kang, Minhee

AU - Jeon, Sang Chul

AU - Kim, Young Su

AU - Park, Q. Han

AU - Jeong, Ki Hun

PY - 2017/6/7

Y1 - 2017/6/7

N2 - We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.

AB - We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.

KW - meta-photoresist

KW - subdiffraction limit

KW - superlens effect

KW - surface plasmon excitation

KW - ultraviolet nanolithography

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JF - ACS Applied Materials and Interfaces

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Optically Patternable Metamaterial below Diffraction Limit

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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