Optimizing n-type contact design and chip size for high-performance indium gallium nitride/gallium nitride-based thin-film vertical light-emitting diode

  • Jaecheon Han
  • , Daehee Lee
  • , Boram Jin
  • , Hwanhee Jeong
  • , June O. Song
  • , Tae Yeon Seong*
  • *Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    21 Citations (Scopus)

    Abstract

    The effects of the n-contact design and chip size on the electrical, optical and thermal characteristics of thin-film vertical light-emitting diodes (VLEDs) were investigated to optimize GaN-based LED performance for solid-state lighting applications. For the small (chip size: 1000×1000 μm2) and large (1450×1450 μm2) VLEDs, the forward bias voltages are decreased from 3.22 to 3.12 V at 350 mA and from 3.44 to 3.16 V at 700 mA, respectively, as the number of n-contact via holes is increased. The small LEDs give maximum output powers of 651.0-675.4 mW at a drive current of 350 mA, while the large VLEDs show the light output powers in the range 1356.7-1380.2 mW, 700 mA, With increasing drive current, the small chips go through more severe degradation in the wall-plug efficiency than the large chips. The small chips give the junction temperatures in the range 51.1-57.2 °C at 350 mA, while the large chips show the junction temperatures of 83.1-93.0 °C at 700 mA, The small LED chips exhibit lower junction temperatures when equipped with more n-contact via holes.

    Original languageEnglish
    Pages (from-to)153-159
    Number of pages7
    JournalMaterials Science in Semiconductor Processing
    Volume31
    DOIs
    Publication statusPublished - 2015 Mar

    Bibliographical note

    Publisher Copyright:
    © 2014 Elsevier Ltd. All rights reserved.

    Keywords

    • GaN
    • Ohmic contact
    • Vertical LED
    • Via hole

    ASJC Scopus subject areas

    • General Materials Science
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

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