Abstract
Among p-n junction devices with multilayered heterostructures with WSe2 and MoSe2, a device with the MoSe2-WSe2-MoSe2 (NPN) structure showed a remarkably high photoresponse, which was 1000 times higher than the MoSe2-WSe2 (NP) structure. The ideality factor of the NPN structure was estimated to be â1, lower than that of the NP structure. It is claimed that the NPN structure formed a thinner depletion region than that of the NP structure because of the difference of carrier concentrations of MoSe2 and WSe2. Hence, the built-in electric field was weaker, and the motion of the photocarriers was facilitated. These behaviors were confirmed experimentally from a photocurrent mapping analysis and Kelvin probe force microscopy. The work function depended on the wavelength of the illuminator, and quasi-Fermi level was estimated. The surface photovoltage on the MoSe2 region was higher than that on WSe2 because the lower bandgap of MoSe2 induces more electron-hole pair generation.
Original language | English |
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Pages (from-to) | 1934-1943 |
Number of pages | 10 |
Journal | Nano Letters |
Volume | 20 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2020 Mar 11 |
Bibliographical note
Publisher Copyright:Copyright © 2020 American Chemical Society.
Keywords
- MoSe
- Multilayered heterostructures
- Transition metal dichalcogenides
- Two-dimensional materials
- WSe
- p-n junction
ASJC Scopus subject areas
- Bioengineering
- General Chemistry
- General Materials Science
- Condensed Matter Physics
- Mechanical Engineering