Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns

Jaewon Choi, Yinyong Li, Paul Y. Kim, Feng Liu, Hyeyoung Kim, Duk Man Yu, June Huh, Kenneth R. Carter, Thomas P. Russell

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)


We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70L0. A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.

Original languageEnglish
Pages (from-to)8324-8332
Number of pages9
JournalACS Applied Materials and Interfaces
Issue number9
Publication statusPublished - 2018 Mar 7

Bibliographical note

Funding Information:
This work was supported by the National Science Foundation (NSF) supported Center for Hierarchical Manufacturing (CMMI-1025020) at the University of Massachusetts, Amherst, and by the Air Force Office of Science Research under contract 16RT1602. This research used resources of the Advanced Light Source, which is a DOE Office of Science User Facility under contract No. DE-AC02-05CH11231. J.C. acknowledges Samsung Scholarship from the Samsung Foundation for financial support.

Publisher Copyright:
© 2018 American Chemical Society.

ASJC Scopus subject areas

  • General Materials Science


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