Oxygen-plasma treatment for low-temperature processing of lead-zirconate-titanate thin films

Eung Ryul Park, Hyuk Kyoo Jang, Eung Kil Kang, Cheol Eui Lee

    Research output: Contribution to journalArticlepeer-review

    2 Citations (Scopus)

    Abstract

    Low-temperature processing of ferroelectric thin films has remained a major barrier to their practical applications. In this work, RF and microwave oxygen-plasma treatment has been employed for low-temperature processing of ferroelectric thin films of sol-gel-derived Pb(Zrx,Ti1-x)O3 (PZT). The as-coated PZT films were annealed in oxygen ambience at 450-°C. Subsequent RF oxygen-plasma treatment at 200 and 300-°C resulted in fair ferroelectric hystereses. Besides, room-temperature microwave oxygen-plasma treatment gave rise to remanent polarizations as large as 15-μC/cm2.

    Original languageEnglish
    Pages (from-to)536-540
    Number of pages5
    JournalMaterials Research Bulletin
    Volume41
    Issue number3
    DOIs
    Publication statusPublished - 2006 Mar 9

    Bibliographical note

    Funding Information:
    This work was supported by the Korea Science and Engineering Foundation (M202AK010021-04A1101-02110 and National Research Laboratory) and by the Korea Research Foundation (Grant No. KRF-2004-005-C00060 and Brain Korea 21 Project in 2005).

    Copyright:
    Copyright 2008 Elsevier B.V., All rights reserved.

    Keywords

    • A. Thin films
    • B. Epitaxial growth
    • C. Photoelectron spectroscopy
    • D. Ferroelectricity

    ASJC Scopus subject areas

    • General Materials Science
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

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