Patterning of the self-assembled monolayer using the zero residual nano-imprint lithography

Ki Yeon Yang, Jong Woo Kim, Sung Hoon Hong, Heon Lee

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    Self-Assembled Monolayer (SAM) is a single layer of ordered molecules absorbed on a surface by chemical bonding between the molecular head group and the surface. The surface properties can be controlled by the terminal functional group of the SAM layer. In order to utilize SAM layers for device applications, SAM layer needs to be patterned as a sub-micron size. Patterning of SAM layer in sub-micron size has been done by various techniques including direct-writing by dip-pen nano lithography, selective etching with UV photons, and selective deposition of SAM layer by n-contact printing. In this study, silane based SAM layer was patterned to the sub-micron size using zero residual Nano imprint Lithography, which is regarded as next generation lithography technique due to its simplicity, high throughput and high resolution pattern transferring capability. Using zero-residual layer imprinting, 300nm-2um sized SAM patterns can successfully fabricated. In order to check the surface property of patterned SAM layer, a solution containing nano Ag particles was spin-coated on the SAM patterned substrate and nano Ag particles were selectively deposited on the substrate.

    Original languageEnglish
    Title of host publicationAdvances in Nanomaterials and Processing - IUMRS - ICA - 2006 International Conference in Asia
    PublisherTrans Tech Publications Ltd
    Pages523-526
    Number of pages4
    EditionPART 1
    ISBN (Print)3908451310, 9783908451310
    DOIs
    Publication statusPublished - 2007
    EventIUMRS International Conference in Asia 2006, IUMRS-ICA 2006 - Jeju, Korea, Republic of
    Duration: 2006 Sept 102006 Sept 14

    Publication series

    NameSolid State Phenomena
    NumberPART 1
    Volume124-126
    ISSN (Print)1012-0394

    Other

    OtherIUMRS International Conference in Asia 2006, IUMRS-ICA 2006
    Country/TerritoryKorea, Republic of
    CityJeju
    Period06/9/1006/9/14

    Keywords

    • Nano imprint lithography
    • Patterning SAMs
    • Zero residual layer imprinting

    ASJC Scopus subject areas

    • Atomic and Molecular Physics, and Optics
    • General Materials Science
    • Condensed Matter Physics

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