Patterning of the self-assembled monolayer using the zero residual nano-imprint lithography

Engineering & Materials Science

• Etching 6%
• Functional groups 8%
• Lithography 69%
• Molecules 6%
• Photons 7%
• Printing 6%
• Self assembled monolayers 100%
• Silanes 8%
• Substrates 9%
• Surface properties 12%
• Throughput 4%

Physics & Astronomy

• etching 5%
• high resolution 4%
• lithography 53%
• molecules 3%
• particle spin 9%
• pens 9%
• photons 3%
• printing 7%
• silanes 7%
• surface properties 14%

Chemical Compounds

• Application 2%
• Etching 5%
• Molecule 2%
• Photon 6%
• Self Assembled Monolayer 62%
• Silane 6%
• Surface 8%