Photo-insensitive amorphous oxide thin-film transistor integrated with a plasmonic filter for transparent electronics

Seongpil Chang, Yun Seon Do, Jong Woo Kim, Bo Yeon Hwang, Jinnil Choi, Byung Hyun Choi, Yun Hi Lee, Kyung Cheol Choi, Byeong Kwon Ju

    Research output: Contribution to journalArticlepeer-review

    16 Citations (Scopus)

    Abstract

    A study was conducted to demonstrate how a photo-insensitive amorphous oxide thin-film transistor was integrated with a plasmonic filter (PF) for transparent electronics. Metal structures at the submicron scale demonstrated a unique optical response known as a surface plasmon (SP). A metallic film with two dimensional nanohole arrays showed high transmission at the SP resonance frequency and the optical response related to this resonance phenomenon could be easily designed by the material and geometrical factors. This structural coloring technology using thin metal films was found to be superior in filtering performance as compared to the conventional dye-based color filter that experienced degradation by heat and light due to the low chemical stability of the organic-dye material.

    Original languageEnglish
    Pages (from-to)3482-3487
    Number of pages6
    JournalAdvanced Functional Materials
    Volume24
    Issue number23
    DOIs
    Publication statusPublished - 2014 Jun 18

    Keywords

    • amorphous oxides
    • negative bias illumination stress
    • plasmonic filters
    • semiconductors
    • transistors
    • transparent electronics

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • General Chemistry
    • General Materials Science

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