Photochemical reactions of a dimethacrylate compound containing a chalcone moiety in the main chain

Dong Hoon Choi; Sang Joon Oh

doi:10.1016/S0014-3057(02)00038-1

Photochemical reactions of a dimethacrylate compound containing a chalcone moiety in the main chain

Dong Hoon Choi, Sang Joon Oh

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

Abstract

We synthesized the new photosensitive oligomer containing a chalcone moiety in the main chain by end-capping reaction of diepoxide compound with methacrylic acid. The chalcone-epoxy oligomeric compound was synthesized with 4,4(′)-dihydroxychalcone and epichlorohydrin. Investigation of the photosensitivity of the newly synthesized chalcone oligomer was carried out by using UV-Vis absorption and infrared spectroscopies under UV exposure. We observed the photodimerization behavior under UV irradiation. At the same time, we could also observe the photopolymerization of the compound with a trace amount of dimethoxyphenyl acetophenone. Thermal properties of UV-cured dimethacrylate compounds were also studied.

Original language	English
Pages (from-to)	1559-1564
Number of pages	6
Journal	European Polymer Journal
Volume	38
Issue number	8
DOIs	https://doi.org/10.1016/S0014-3057(02)00038-1
Publication status	Published - 2002 Aug
Externally published	Yes

Bibliographical note

Funding Information:
This work was financially supported by a grant from Korea Research Foundation (2001-005-D00004).

Keywords

Chalcone
Photocrosslink
Photopolymerization
Photosensitive
UV irradiation

ASJC Scopus subject areas

General Physics and Astronomy
Organic Chemistry
Polymers and Plastics
Materials Chemistry

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10.1016/S0014-3057(02)00038-1

Cite this

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title = "Photochemical reactions of a dimethacrylate compound containing a chalcone moiety in the main chain",

abstract = "We synthesized the new photosensitive oligomer containing a chalcone moiety in the main chain by end-capping reaction of diepoxide compound with methacrylic acid. The chalcone-epoxy oligomeric compound was synthesized with 4,4(′)-dihydroxychalcone and epichlorohydrin. Investigation of the photosensitivity of the newly synthesized chalcone oligomer was carried out by using UV-Vis absorption and infrared spectroscopies under UV exposure. We observed the photodimerization behavior under UV irradiation. At the same time, we could also observe the photopolymerization of the compound with a trace amount of dimethoxyphenyl acetophenone. Thermal properties of UV-cured dimethacrylate compounds were also studied.",

keywords = "Chalcone, Photocrosslink, Photopolymerization, Photosensitive, UV irradiation",

author = "Choi, {Dong Hoon} and Oh, {Sang Joon}",

note = "Funding Information: This work was financially supported by a grant from Korea Research Foundation (2001-005-D00004). ",

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doi = "10.1016/S0014-3057(02)00038-1",

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T1 - Photochemical reactions of a dimethacrylate compound containing a chalcone moiety in the main chain

AU - Choi, Dong Hoon

AU - Oh, Sang Joon

N1 - Funding Information: This work was financially supported by a grant from Korea Research Foundation (2001-005-D00004).

PY - 2002/8

Y1 - 2002/8

N2 - We synthesized the new photosensitive oligomer containing a chalcone moiety in the main chain by end-capping reaction of diepoxide compound with methacrylic acid. The chalcone-epoxy oligomeric compound was synthesized with 4,4(′)-dihydroxychalcone and epichlorohydrin. Investigation of the photosensitivity of the newly synthesized chalcone oligomer was carried out by using UV-Vis absorption and infrared spectroscopies under UV exposure. We observed the photodimerization behavior under UV irradiation. At the same time, we could also observe the photopolymerization of the compound with a trace amount of dimethoxyphenyl acetophenone. Thermal properties of UV-cured dimethacrylate compounds were also studied.

AB - We synthesized the new photosensitive oligomer containing a chalcone moiety in the main chain by end-capping reaction of diepoxide compound with methacrylic acid. The chalcone-epoxy oligomeric compound was synthesized with 4,4(′)-dihydroxychalcone and epichlorohydrin. Investigation of the photosensitivity of the newly synthesized chalcone oligomer was carried out by using UV-Vis absorption and infrared spectroscopies under UV exposure. We observed the photodimerization behavior under UV irradiation. At the same time, we could also observe the photopolymerization of the compound with a trace amount of dimethoxyphenyl acetophenone. Thermal properties of UV-cured dimethacrylate compounds were also studied.

KW - Chalcone

KW - Photocrosslink

KW - Photopolymerization

KW - Photosensitive

KW - UV irradiation

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U2 - 10.1016/S0014-3057(02)00038-1

DO - 10.1016/S0014-3057(02)00038-1

M3 - Article

AN - SCOPUS:0036680778

SN - 0014-3057

VL - 38

SP - 1559

EP - 1564

JO - European Polymer Journal

JF - European Polymer Journal

IS - 8

ER -

Photochemical reactions of a dimethacrylate compound containing a chalcone moiety in the main chain

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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