Photolithography: Rational and Facile Construction of 3D Annular Nanostructures with Tunable Layers by Exploiting the Diffraction and Interference of Light (Adv. Funct. Mater. 29/2016)

  • Jong Ho Choe
  • , Q. Han Park
  • , Eun Ah You*
  • *Corresponding author for this work

    Research output: Contribution to journalComment/debatepeer-review

    Original languageEnglish
    Pages (from-to)5193
    Number of pages1
    JournalAdvanced Functional Materials
    Volume26
    Issue number29
    DOIs
    Publication statusPublished - 2016 Aug 2

    Keywords

    • 3D annular nanostructure
    • diffraction
    • interference
    • modeling
    • photolithography

    ASJC Scopus subject areas

    • General Chemistry
    • General Materials Science
    • Condensed Matter Physics

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