Abstract
We describe a novel strategy to fabricate a well-defined polydiacetylene (PDA) supramolecular pattern on polyvinylidene fluoride (PVDF) membrane utilizing a DNA bio-photomask. By focusing on that, the absorption spectrum of DNA molecules having a λmax at 260 nm overlaps with the wavelength at which the photopolymerization of the diacetylene monomer occurs, DNA molecules are used to define specific patterns on PVDF membranes coated with diacetylene lipids by shielding the applied 254 nm UV light and consequently preventing the photopolymerization of the lipids. As a result, the DNA-covered regions retain the original white color on the membrane while the regions uncovered by DNA molecules undergo the color change to blue through the photopolymerization by 254 nm UV irradiation. On the basis of the selective illumination through a DNA photomask, we precisely manufacture specific patterns using a microarray spotting method and also demonstrate the capability of this strategy to achieve a novel colorimetric DNA sensor without any complicated process.
Original language | English |
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Pages (from-to) | 15684-15690 |
Number of pages | 7 |
Journal | ACS Applied Materials and Interfaces |
Volume | 8 |
Issue number | 24 |
DOIs | |
Publication status | Published - 2016 Jun 22 |
Externally published | Yes |
Bibliographical note
Funding Information:This work was supported by the grant from Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (KRF-2015R1A1A3A04001437), Basic Science Research Program through the NRF funded by the Ministry of Education (No. 2015R1A2A1A01005393), and Center for BioNano Health-Guard funded by MSIP of Korea as Global Frontier Project (Grant H-GUARD-2013- M3A6B2078964).
Publisher Copyright:
© 2016 American Chemical Society.
Keywords
- DNA
- PVDF membrane
- bio-photomask
- photopatterning
- polydiacetylene (PDA)
ASJC Scopus subject areas
- General Materials Science