Abstract
We demonstrated a plasmonic color filter adopting laser interference lithography technology. Nano scaled hole arrays were obtained with a regular spatial period through the whole glass substrate area of 2.5 cm x 2.5 cm.
Original language | English |
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Title of host publication | CLEO: Applications and Technology, CLEO_AT 2012 |
Publication status | Published - 2012 Dec 1 |
Event | CLEO: Applications and Technology, CLEO_AT 2012 - San Jose, CA, United States Duration: 2012 May 6 → 2012 May 11 |
Other
Other | CLEO: Applications and Technology, CLEO_AT 2012 |
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Country/Territory | United States |
City | San Jose, CA |
Period | 12/5/6 → 12/5/11 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials