Plasmonic color filters for large area display devices fabricated by laser interference lithography

Yun Seon Do, Jung Ho Park, Bo Yeon Hwang, Sung Min Lee, Byeong Kwon Ju, Kyung Cheol Choi

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    We demonstrated a plasmonic color filter adopting laser interference lithography technology. Nano scaled hole arrays were obtained with a regular spatial period through the whole glass substrate area of 2.5 cm x 2.5 cm.

    Original languageEnglish
    Title of host publication2012 Conference on Lasers and Electro-Optics, CLEO 2012
    Publication statusPublished - 2012
    Event2012 Conference on Lasers and Electro-Optics, CLEO 2012 - San Jose, CA, United States
    Duration: 2012 May 62012 May 11

    Publication series

    Name2012 Conference on Lasers and Electro-Optics, CLEO 2012

    Other

    Other2012 Conference on Lasers and Electro-Optics, CLEO 2012
    Country/TerritoryUnited States
    CitySan Jose, CA
    Period12/5/612/5/11

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials

    Fingerprint

    Dive into the research topics of 'Plasmonic color filters for large area display devices fabricated by laser interference lithography'. Together they form a unique fingerprint.

    Cite this