Nanoimprint lithography (NIL) is the next-generation alternative to conventional photolithography involving an inexpensive and high throughput process. However, conventional NIL equipment requires a bulky air compressor which possesses a large area. This study aims to overcome this limitation by introducing a novel hydraulic ultra-violet (UV) imprint system. Hydraulic UV imprint system can be used to conduct the UV NIL process by using a simple, low-cost materials without needing complex equipment. To form various patterned layers, UV NIL was conducted with various master stamps.(diameter: micro-cones:3 μm, nanopillars:200 nm, nanoholes: 200 nm) The performance of the imprint system was verified by using scanning electron microscopy analysis of samples fabricated by new system. The results showed that the performance of the new imprint system was comparable to that of a conventional air-pressure UV imprint system.
Bibliographical noteFunding Information:
This research was supported by the HUNETPLUS Co. for technical support for the design and development of the hydraulic chamber UV filters. It was also supported by Technology Innovation Program (20000887, Development of self healing impact resistant film coating material and process technology for rollable displays) funded by the Ministry of Trade, Industry & Energy(MOTIE, Korea), Technology Innovation Program ( N0002310 ) funded by the Ministry of Trade, Industry & Energy (MOTIE, Korea) and Creative Materials Discovery Program through the National Research Foundation of Korea(NRF) funded by Ministry of Science and ICT ( NRF-2018M3D1A1058972 ).
- Hydraulic pressure
- Residual layer
- UV imprint
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering