Portable UV nanoimprint lithography system using hydraulic pressure

Hojung Kang; Eunseo Choi; Jaemin Park; Young Hoon Sung; Kwan Kim; Sucheol Ju; Heon Lee

doi:10.1016/j.mee.2021.111587

Portable UV nanoimprint lithography system using hydraulic pressure

Hojung Kang, Eunseo Choi, Jaemin Park, Young Hoon Sung, Kwan Kim, Sucheol Ju, Heon Lee

Research output: Contribution to journal › Article › peer-review

Abstract

Nanoimprint lithography (NIL) is the next-generation alternative to conventional photolithography involving an inexpensive and high throughput process. However, conventional NIL equipment requires a bulky air compressor which possesses a large area. This study aims to overcome this limitation by introducing a novel hydraulic ultra-violet (UV) imprint system. Hydraulic UV imprint system can be used to conduct the UV NIL process by using a simple, low-cost materials without needing complex equipment. To form various patterned layers, UV NIL was conducted with various master stamps.(diameter: micro-cones:3 μm, nanopillars:200 nm, nanoholes: 200 nm) The performance of the imprint system was verified by using scanning electron microscopy analysis of samples fabricated by new system. The results showed that the performance of the new imprint system was comparable to that of a conventional air-pressure UV imprint system.

Original language	English
Article number	111587
Journal	Microelectronic Engineering
Volume	247
DOIs	https://doi.org/10.1016/j.mee.2021.111587
Publication status	Published - 2021 Jul 15

Bibliographical note

Funding Information:
This research was supported by the HUNETPLUS Co. for technical support for the design and development of the hydraulic chamber UV filters. It was also supported by Technology Innovation Program (20000887, Development of self healing impact resistant film coating material and process technology for rollable displays) funded by the Ministry of Trade, Industry & Energy(MOTIE, Korea), Technology Innovation Program ( N0002310 ) funded by the Ministry of Trade, Industry & Energy (MOTIE, Korea) and Creative Materials Discovery Program through the National Research Foundation of Korea(NRF) funded by Ministry of Science and ICT ( NRF-2018M3D1A1058972 ).

Publisher Copyright:
© 2021

Keywords

Hydraulic pressure
NIL
Portable
Residual layer
UV imprint

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mee.2021.111587

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abstract = "Nanoimprint lithography (NIL) is the next-generation alternative to conventional photolithography involving an inexpensive and high throughput process. However, conventional NIL equipment requires a bulky air compressor which possesses a large area. This study aims to overcome this limitation by introducing a novel hydraulic ultra-violet (UV) imprint system. Hydraulic UV imprint system can be used to conduct the UV NIL process by using a simple, low-cost materials without needing complex equipment. To form various patterned layers, UV NIL was conducted with various master stamps.(diameter: micro-cones:3 μm, nanopillars:200 nm, nanoholes: 200 nm) The performance of the imprint system was verified by using scanning electron microscopy analysis of samples fabricated by new system. The results showed that the performance of the new imprint system was comparable to that of a conventional air-pressure UV imprint system.",

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author = "Hojung Kang and Eunseo Choi and Jaemin Park and Sung, {Young Hoon} and Kwan Kim and Sucheol Ju and Heon Lee",

note = "Funding Information: This research was supported by the HUNETPLUS Co. for technical support for the design and development of the hydraulic chamber UV filters. It was also supported by Technology Innovation Program (20000887, Development of self healing impact resistant film coating material and process technology for rollable displays) funded by the Ministry of Trade, Industry & Energy(MOTIE, Korea), Technology Innovation Program ( N0002310 ) funded by the Ministry of Trade, Industry & Energy (MOTIE, Korea) and Creative Materials Discovery Program through the National Research Foundation of Korea(NRF) funded by Ministry of Science and ICT ( NRF-2018M3D1A1058972 ). Publisher Copyright: {\textcopyright} 2021",

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AU - Choi, Eunseo

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AU - Kim, Kwan

AU - Ju, Sucheol

AU - Lee, Heon

N1 - Funding Information: This research was supported by the HUNETPLUS Co. for technical support for the design and development of the hydraulic chamber UV filters. It was also supported by Technology Innovation Program (20000887, Development of self healing impact resistant film coating material and process technology for rollable displays) funded by the Ministry of Trade, Industry & Energy(MOTIE, Korea), Technology Innovation Program ( N0002310 ) funded by the Ministry of Trade, Industry & Energy (MOTIE, Korea) and Creative Materials Discovery Program through the National Research Foundation of Korea(NRF) funded by Ministry of Science and ICT ( NRF-2018M3D1A1058972 ). Publisher Copyright: © 2021

PY - 2021/7/15

Y1 - 2021/7/15

N2 - Nanoimprint lithography (NIL) is the next-generation alternative to conventional photolithography involving an inexpensive and high throughput process. However, conventional NIL equipment requires a bulky air compressor which possesses a large area. This study aims to overcome this limitation by introducing a novel hydraulic ultra-violet (UV) imprint system. Hydraulic UV imprint system can be used to conduct the UV NIL process by using a simple, low-cost materials without needing complex equipment. To form various patterned layers, UV NIL was conducted with various master stamps.(diameter: micro-cones:3 μm, nanopillars:200 nm, nanoholes: 200 nm) The performance of the imprint system was verified by using scanning electron microscopy analysis of samples fabricated by new system. The results showed that the performance of the new imprint system was comparable to that of a conventional air-pressure UV imprint system.

AB - Nanoimprint lithography (NIL) is the next-generation alternative to conventional photolithography involving an inexpensive and high throughput process. However, conventional NIL equipment requires a bulky air compressor which possesses a large area. This study aims to overcome this limitation by introducing a novel hydraulic ultra-violet (UV) imprint system. Hydraulic UV imprint system can be used to conduct the UV NIL process by using a simple, low-cost materials without needing complex equipment. To form various patterned layers, UV NIL was conducted with various master stamps.(diameter: micro-cones:3 μm, nanopillars:200 nm, nanoholes: 200 nm) The performance of the imprint system was verified by using scanning electron microscopy analysis of samples fabricated by new system. The results showed that the performance of the new imprint system was comparable to that of a conventional air-pressure UV imprint system.

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Portable UV nanoimprint lithography system using hydraulic pressure

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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