Potential of NiOx/Nickel Silicide/n+ Poly-Si Contact for Perovskite/TOPCon Tandem Solar Cells

Jiryang Kim; Dowon Pyun; Dongjin Choi; Seok Hyun Jeong; Changhyun Lee; Jiyeon Hyun; Ha Eun Lee; Sang Won Lee; Hoyoung Song; Solhee Lee; Donghwan Kim; Yoonmook Kang; Hae Seok Lee

doi:10.3390/en15030870

Potential of NiO_x/Nickel Silicide/n⁺ Poly-Si Contact for Perovskite/TOPCon Tandem Solar Cells

Jiryang Kim, Dowon Pyun, Dongjin Choi, Seok Hyun Jeong, Changhyun Lee, Jiyeon Hyun, Ha Eun Lee, Sang Won Lee, Hoyoung Song, Solhee Lee, Donghwan Kim, Yoonmook Kang, Hae Seok Lee

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

In this work, nickel silicide was applied to tandem solar cells as an interlayer. By the process of thermal evaporation, a layer of NiO_x, hole transport layer (HTL) was deposited on n⁺ poly-Si layer directly. Nickel silicide was simultaneously formed by nickel diffusion from NiO_x to n⁺ poly-Si layer during the deposition and annealing process. The I–V characteristics of NiO_x/n⁺ poly-Si contact with nickel silicide showed ohmic contact and low contact resistivity. This structure is expected to be more advantageous for electrical connection between perovskite top cell and TOPCon bottom cell compared to the NiO_x/TCO/n⁺ poly-Si structure showing Schottky contact. Furthermore, nickel silicide and Ni-deficient NiO_x thin film formed by diffusion of nickel can improve the fill factor of the two sub cells. These results imply the potential of a NiO_x/nickel silicide/n⁺ poly-Si structure as a perovskite/silicon tandem solar cell interlayer.

Original language	English
Article number	870
Journal	Energies
Volume	15
Issue number	3
DOIs	https://doi.org/10.3390/en15030870
Publication status	Published - 2022 Feb 1
Externally published	Yes

Keywords

NiO/n poly-Si contact
Nickel silicide
Perovskite/silicon tandem solar cells
X-ray photoelectron spectroscopy

ASJC Scopus subject areas

Control and Optimization
Energy (miscellaneous)
Engineering (miscellaneous)
Energy Engineering and Power Technology
Electrical and Electronic Engineering
Building and Construction
Fuel Technology
Renewable Energy, Sustainability and the Environment

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.3390/en15030870

Cite this

@article{296d8a6cba084ee2bc089bd49a080d51,

title = "Potential of NiOx/Nickel Silicide/n+ Poly-Si Contact for Perovskite/TOPCon Tandem Solar Cells",

abstract = "In this work, nickel silicide was applied to tandem solar cells as an interlayer. By the process of thermal evaporation, a layer of NiOx, hole transport layer (HTL) was deposited on n+ poly-Si layer directly. Nickel silicide was simultaneously formed by nickel diffusion from NiOx to n+ poly-Si layer during the deposition and annealing process. The I–V characteristics of NiOx/n+ poly-Si contact with nickel silicide showed ohmic contact and low contact resistivity. This structure is expected to be more advantageous for electrical connection between perovskite top cell and TOPCon bottom cell compared to the NiOx/TCO/n+ poly-Si structure showing Schottky contact. Furthermore, nickel silicide and Ni-deficient NiOx thin film formed by diffusion of nickel can improve the fill factor of the two sub cells. These results imply the potential of a NiOx/nickel silicide/n+ poly-Si structure as a perovskite/silicon tandem solar cell interlayer.",

keywords = "NiO/n poly-Si contact, Nickel silicide, Perovskite/silicon tandem solar cells, X-ray photoelectron spectroscopy",

author = "Jiryang Kim and Dowon Pyun and Dongjin Choi and Jeong, {Seok Hyun} and Changhyun Lee and Jiyeon Hyun and Lee, {Ha Eun} and Lee, {Sang Won} and Hoyoung Song and Solhee Lee and Donghwan Kim and Yoonmook Kang and Lee, {Hae Seok}",

note = "Funding Information: Funding: This work was conducted under the New and Renewable Energy Core Technology Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) granted financial from the Ministry of Trade, Industry and Energy, Republic of Korea (No. 20193010014530). This work was supported by the Human Resources Program in Energy Technology of the Korea Institute of Energy Technology Evaluation and Planning (KETEP), granted financial resource from the Ministry of Trade, Industry and Energy, Republic of Korea. (No. 20204010600470). Publisher Copyright: {\textcopyright} 2022 by the authors. Licensee MDPI, Basel, Switzerland.",

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doi = "10.3390/en15030870",

language = "English",

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T1 - Potential of NiOx/Nickel Silicide/n+ Poly-Si Contact for Perovskite/TOPCon Tandem Solar Cells

AU - Kim, Jiryang

AU - Pyun, Dowon

AU - Choi, Dongjin

AU - Jeong, Seok Hyun

AU - Lee, Changhyun

AU - Hyun, Jiyeon

AU - Lee, Ha Eun

AU - Lee, Sang Won

AU - Song, Hoyoung

AU - Lee, Solhee

AU - Kim, Donghwan

AU - Kang, Yoonmook

AU - Lee, Hae Seok

N1 - Funding Information: Funding: This work was conducted under the New and Renewable Energy Core Technology Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) granted financial from the Ministry of Trade, Industry and Energy, Republic of Korea (No. 20193010014530). This work was supported by the Human Resources Program in Energy Technology of the Korea Institute of Energy Technology Evaluation and Planning (KETEP), granted financial resource from the Ministry of Trade, Industry and Energy, Republic of Korea. (No. 20204010600470). Publisher Copyright: © 2022 by the authors. Licensee MDPI, Basel, Switzerland.

PY - 2022/2/1

Y1 - 2022/2/1

N2 - In this work, nickel silicide was applied to tandem solar cells as an interlayer. By the process of thermal evaporation, a layer of NiOx, hole transport layer (HTL) was deposited on n+ poly-Si layer directly. Nickel silicide was simultaneously formed by nickel diffusion from NiOx to n+ poly-Si layer during the deposition and annealing process. The I–V characteristics of NiOx/n+ poly-Si contact with nickel silicide showed ohmic contact and low contact resistivity. This structure is expected to be more advantageous for electrical connection between perovskite top cell and TOPCon bottom cell compared to the NiOx/TCO/n+ poly-Si structure showing Schottky contact. Furthermore, nickel silicide and Ni-deficient NiOx thin film formed by diffusion of nickel can improve the fill factor of the two sub cells. These results imply the potential of a NiOx/nickel silicide/n+ poly-Si structure as a perovskite/silicon tandem solar cell interlayer.

AB - In this work, nickel silicide was applied to tandem solar cells as an interlayer. By the process of thermal evaporation, a layer of NiOx, hole transport layer (HTL) was deposited on n+ poly-Si layer directly. Nickel silicide was simultaneously formed by nickel diffusion from NiOx to n+ poly-Si layer during the deposition and annealing process. The I–V characteristics of NiOx/n+ poly-Si contact with nickel silicide showed ohmic contact and low contact resistivity. This structure is expected to be more advantageous for electrical connection between perovskite top cell and TOPCon bottom cell compared to the NiOx/TCO/n+ poly-Si structure showing Schottky contact. Furthermore, nickel silicide and Ni-deficient NiOx thin film formed by diffusion of nickel can improve the fill factor of the two sub cells. These results imply the potential of a NiOx/nickel silicide/n+ poly-Si structure as a perovskite/silicon tandem solar cell interlayer.

KW - NiO/n poly-Si contact

KW - Nickel silicide

KW - Perovskite/silicon tandem solar cells

KW - X-ray photoelectron spectroscopy

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