Preparation of thin film YSZ electrolyte by using electrostatic spray deposition

Joonho Kim; Youngsun Park; Dae Jin Sung; Sangjin Moon; Ki Bong Lee; Suk In Hong

doi:10.1016/j.ijrmhm.2009.07.001

Preparation of thin film YSZ electrolyte by using electrostatic spray deposition

Joonho Kim, Youngsun Park, Dae Jin Sung, Sangjin Moon, Ki Bong Lee, Suk In Hong

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

Yttria-stabilized zirconia (YSZ) thin film was successfully deposited onto Ni-YSZ anode disk by the electrostatic spray deposition (ESD) technique. To deposit a dense YSZ thin film onto porous Ni-YSZ substrate, the influence of process parameter variables were examined. The relationship between process parameters and morphologies of YSZ films coated by ESD was investigated by means of SEM photography and X-ray diffraction (XRD). The result showed that dense YSZ film of average 10-15 μm thickness was deposited on the porous Ni-YSZ substrate with temperature of 400 °C, the precursor solution concentration of 0.05 M, nozzle-to-substrate distance of 30 mm, applied electric field of 18 kV, and deposition time of 90 min.

Original language	English
Pages (from-to)	985-990
Number of pages	6
Journal	International Journal of Refractory Metals and Hard Materials
Volume	27
Issue number	6
DOIs	https://doi.org/10.1016/j.ijrmhm.2009.07.001
Publication status	Published - 2009 Nov

Keywords

Electrostatic spray deposition
SOFC
Thin films
YSZ

ASJC Scopus subject areas

Ceramics and Composites
Mechanics of Materials
Mechanical Engineering
Metals and Alloys
Materials Chemistry

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10.1016/j.ijrmhm.2009.07.001

Cite this

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title = "Preparation of thin film YSZ electrolyte by using electrostatic spray deposition",

abstract = "Yttria-stabilized zirconia (YSZ) thin film was successfully deposited onto Ni-YSZ anode disk by the electrostatic spray deposition (ESD) technique. To deposit a dense YSZ thin film onto porous Ni-YSZ substrate, the influence of process parameter variables were examined. The relationship between process parameters and morphologies of YSZ films coated by ESD was investigated by means of SEM photography and X-ray diffraction (XRD). The result showed that dense YSZ film of average 10-15 μm thickness was deposited on the porous Ni-YSZ substrate with temperature of 400 °C, the precursor solution concentration of 0.05 M, nozzle-to-substrate distance of 30 mm, applied electric field of 18 kV, and deposition time of 90 min.",

keywords = "Electrostatic spray deposition, SOFC, Thin films, YSZ",

author = "Joonho Kim and Youngsun Park and Sung, {Dae Jin} and Sangjin Moon and Lee, {Ki Bong} and Hong, {Suk In}",

year = "2009",

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doi = "10.1016/j.ijrmhm.2009.07.001",

language = "English",

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pages = "985--990",

journal = "International Journal of Refractory Metals and Hard Materials",

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TY - JOUR

T1 - Preparation of thin film YSZ electrolyte by using electrostatic spray deposition

AU - Kim, Joonho

AU - Park, Youngsun

AU - Sung, Dae Jin

AU - Moon, Sangjin

AU - Lee, Ki Bong

AU - Hong, Suk In

PY - 2009/11

Y1 - 2009/11

N2 - Yttria-stabilized zirconia (YSZ) thin film was successfully deposited onto Ni-YSZ anode disk by the electrostatic spray deposition (ESD) technique. To deposit a dense YSZ thin film onto porous Ni-YSZ substrate, the influence of process parameter variables were examined. The relationship between process parameters and morphologies of YSZ films coated by ESD was investigated by means of SEM photography and X-ray diffraction (XRD). The result showed that dense YSZ film of average 10-15 μm thickness was deposited on the porous Ni-YSZ substrate with temperature of 400 °C, the precursor solution concentration of 0.05 M, nozzle-to-substrate distance of 30 mm, applied electric field of 18 kV, and deposition time of 90 min.

AB - Yttria-stabilized zirconia (YSZ) thin film was successfully deposited onto Ni-YSZ anode disk by the electrostatic spray deposition (ESD) technique. To deposit a dense YSZ thin film onto porous Ni-YSZ substrate, the influence of process parameter variables were examined. The relationship between process parameters and morphologies of YSZ films coated by ESD was investigated by means of SEM photography and X-ray diffraction (XRD). The result showed that dense YSZ film of average 10-15 μm thickness was deposited on the porous Ni-YSZ substrate with temperature of 400 °C, the precursor solution concentration of 0.05 M, nozzle-to-substrate distance of 30 mm, applied electric field of 18 kV, and deposition time of 90 min.

KW - Electrostatic spray deposition

KW - SOFC

KW - Thin films

KW - YSZ

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JO - International Journal of Refractory Metals and Hard Materials

JF - International Journal of Refractory Metals and Hard Materials

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Preparation of thin film YSZ electrolyte by using electrostatic spray deposition

Abstract

Keywords

ASJC Scopus subject areas

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