Pretreatment by selective ion-implantation for epitaxial lateral overgrowth of GaN on patterned sapphire substrate

Dae sik Kim, Woo Seop Jeong, Hyungduk Ko, Jae Sang Lee, Dongjin Byun

    Research output: Contribution to journalArticlepeer-review

    6 Citations (Scopus)

    Abstract

    Epitaxial lateral overgrowth (ELO) process of gallium nitride (GaN) films on cone-shaped patterned sapphire substrate (PSS), which was pretreated by ion-implantation was performed by using a metal organic chemical vapor deposition. A 250-nm-thick silicon dioxide (SiO2) mask was covered on the planar surface of the PSS to protect them from ion-implantation damages, whereas the cone-shaped patterns of the PSS were exposed to collide with the N+ ions. The ion-implantation pretreatment was selectively carried out on the cone-shaped pattern of PSS at 67.5 keV with a high dose of 5 × 1017 cm− 2. As a result of ion-implantation pretreatment, nucleation growth of GaN poly-grains was inhibited on the cone-shaped patterns with various crystal planes, such as c-like plane, R-like plane, and n-like plane. Surface roughness and crystal quality of GaN films grown on ion-implanted PSS were improved owing to the inhibition of nucleation growth on the patterns. The ion-implantation pretreatment is a very promising technique in the ELO process of GaN on an uneven substrate such as a cone-shaped PSS that includes various crystal planes.

    Original languageEnglish
    Pages (from-to)2-7
    Number of pages6
    JournalThin Solid Films
    Volume641
    DOIs
    Publication statusPublished - 2017 Nov 1

    Bibliographical note

    Publisher Copyright:
    © 2017

    Keywords

    • Epitaxial lateral overgrowth
    • Gallium nitride
    • Ion-implantation
    • Metal organic chemical vapor deposition
    • Patterned sapphire substrate

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry

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