TY - GEN
T1 - Printed silicon broadband membrane reflectors by laser interference lithography
AU - Ha, Hyeon Jun
AU - Park, Jungho
AU - Hwang, Bo Yeon
AU - Lee, Sangbin
AU - Ju, Byeong Kwon
PY - 2013
Y1 - 2013
N2 - We report on printed silicon photonic crystal broadband membrane reflectors (MRs) based on laser interference lithography (LIL) patterning. Single-layer photonic crystal membrane which was formed by the LIL technique on a silicon-on-insulator (SOI) wafer was transferred by the contact printing method using the polydimethylsiloxane (PDMS) stamp on a glass substrate. These broadband silicon-MRs show high-reflectivity of 95 % around 1200 nm wavelength with bandwidth of about 100 nm. This simplest and easiest method to fabricate broadband MRs has great potential for many types of optoelectronic and photonic devices.
AB - We report on printed silicon photonic crystal broadband membrane reflectors (MRs) based on laser interference lithography (LIL) patterning. Single-layer photonic crystal membrane which was formed by the LIL technique on a silicon-on-insulator (SOI) wafer was transferred by the contact printing method using the polydimethylsiloxane (PDMS) stamp on a glass substrate. These broadband silicon-MRs show high-reflectivity of 95 % around 1200 nm wavelength with bandwidth of about 100 nm. This simplest and easiest method to fabricate broadband MRs has great potential for many types of optoelectronic and photonic devices.
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U2 - 10.1109/SMICND.2013.6688107
DO - 10.1109/SMICND.2013.6688107
M3 - Conference contribution
AN - SCOPUS:84893323431
SN - 9781467356701
T3 - Proceedings of the International Semiconductor Conference, CAS
SP - 123
EP - 126
BT - CAS 2013 Proceedings - 2013 International Semiconductor Conference
T2 - 36th International Semiconductor Conference, CAS 2013
Y2 - 14 October 2013 through 16 October 2013
ER -