Keyphrases
Magnetron Sputtering
100%
Fluorine-doped ZnO
100%
Doped ZnO Thin Films
100%
ZnO Film
83%
Fluorine Content
83%
Room Temperature
33%
Electrical Properties
16%
Elevated Temperature
16%
Optical Transmission
16%
Structural Properties
16%
Radio Frequency Magnetron Sputtering
16%
Grain Boundary
16%
Pure Zn
16%
Electrical-optical Properties
16%
Vacuum Annealing
16%
Carrier Concentration
16%
Annealed Films
16%
As-grown
16%
Cm(III)
16%
Chemical Bond
16%
Corning Glass
16%
Oxygen Vacancy
16%
Dangling Bonds
16%
Doping Efficiency
16%
Compositional Properties
16%
Low Doping Concentration
16%
Hall Mobility
16%
Efficiency Level
16%
Gas Mixture
16%
Fluorine Atom
16%
Passivation Effect
16%
Interstitial Zinc
16%
Low Fluorine
16%
Zinc Atom
16%
Engineering
Thin Films
100%
Deposited Film
100%
Magnetron
100%
Room Temperature
66%
Passivation
33%
Radio Frequency
33%
Structural Property
33%
Oxygen Vacancy
33%
Elevated Temperature
33%
Dangling Bond
33%
Efficiency Level
33%
Substantial Increase
33%
Optical Transmission
33%
Grain Boundaries
33%
Carrier Concentration
33%
Gas Mixture
33%
Fluorine Atom
33%
Material Science
Thin Films
100%
Film
100%
ZnO
100%
Magnetron Sputtering
100%
Annealing
9%
Structural Property
9%
Carrier Concentration
9%
Oxygen Vacancy
9%
Zinc
9%
Chemical Bonding
9%
Hall Mobility
9%
Grain Boundaries
9%
Gas Mixture
9%