Properties of hydorogenated Al-doped ZnO films by multi-step texture

Sung Ju Tark; Min Gu Kang; Sungeun Park; Yong Hyun Kim; Won Mok Kim; Donghwan Kim

doi:10.3740/MRSK.2009.19.5.259

Properties of hydorogenated Al-doped ZnO films by multi-step texture

Sung Ju Tark, Min Gu Kang, Sungeun Park, Yong Hyun Kim, Won Mok Kim, Donghwan Kim

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

In this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the H₂/(Ar+H₂) ratio at a low temperature of 150 °C. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of non-hydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.

Original language	English
Pages (from-to)	259-264
Number of pages	6
Journal	Korean Journal of Materials Research
Volume	19
Issue number	5
DOIs	https://doi.org/10.3740/MRSK.2009.19.5.259
Publication status	Published - 2009

Keywords

Hydrogenated
Rf magnetron sputter
Surface textured
TCO
ZnO : Al

ASJC Scopus subject areas

General Materials Science

Access to Document

10.3740/MRSK.2009.19.5.259

Cite this

@article{34f6031c6d7b46389c946a8e5a5b2b74,

title = "Properties of hydorogenated Al-doped ZnO films by multi-step texture",

abstract = "In this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the H2/(Ar+H2) ratio at a low temperature of 150 °C. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of non-hydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.",

keywords = "Hydrogenated, Rf magnetron sputter, Surface textured, TCO, ZnO : Al",

author = "Tark, {Sung Ju} and Kang, {Min Gu} and Sungeun Park and Kim, {Yong Hyun} and Kim, {Won Mok} and Donghwan Kim",

year = "2009",

doi = "10.3740/MRSK.2009.19.5.259",

language = "English",

volume = "19",

pages = "259--264",

journal = "Korean Journal of Materials Research",

issn = "1225-0562",

publisher = "The Korea Federation of Science and Technology",

number = "5",

}

TY - JOUR

T1 - Properties of hydorogenated Al-doped ZnO films by multi-step texture

AU - Tark, Sung Ju

AU - Kang, Min Gu

AU - Park, Sungeun

AU - Kim, Yong Hyun

AU - Kim, Won Mok

AU - Kim, Donghwan

PY - 2009

Y1 - 2009

N2 - In this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the H2/(Ar+H2) ratio at a low temperature of 150 °C. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of non-hydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.

AB - In this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the H2/(Ar+H2) ratio at a low temperature of 150 °C. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of non-hydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.

KW - Hydrogenated

KW - Rf magnetron sputter

KW - Surface textured

KW - TCO

KW - ZnO : Al

UR - http://www.scopus.com/inward/record.url?scp=68549110574&partnerID=8YFLogxK

U2 - 10.3740/MRSK.2009.19.5.259

DO - 10.3740/MRSK.2009.19.5.259

M3 - Article

AN - SCOPUS:68549110574

SN - 1225-0562

VL - 19

SP - 259

EP - 264

JO - Korean Journal of Materials Research

JF - Korean Journal of Materials Research

IS - 5

ER -

Properties of hydorogenated Al-doped ZnO films by multi-step texture

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this