Properties of various ion-implanted sapphire substrates for GaN epilayers

J. Jhin, J. Lee, Dong Jin Byun, J. S. Lee, J. H. Lee, C. Kim, H. Lee, Y. Moon, E. Koh

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    The structural, electrical, and optical properties of GaN epilayers grown on various ion-implanted sapphire (0001) substrates by metal-organic chemical vapor deposition (MOCVD) were investigated. Sapphire is a typical substrate for GaN epilayers. However, there are many problems such as lattice mismatch and thermal coefficient difference between sapphire substrate and GaN. The ion-implanted substrate's surface had decreased internal free energies during the growth of the ion-implanted sapphire (0001) substrates. The crystal and optical properties of GaN epilayers grown in ion-implanted sapphire (0001) substrate were improved. Also, surfaces excessively roughened and modified by ions degraded the GaN epilayers. Not only the ionic radius but also the chemical species of implanted sapphire (0001) substrates could improve the properties of GaN epilayers grown by MOCVD. This result implies that higher quality of GaN epilayers can be obtained using ion-implanted sapphire (0001) substrate with various ions.

    Original languageEnglish
    Title of host publicationPhysica Status Solidi C: Conferences
    Pages2791-2794
    Number of pages4
    Volume201
    Edition12
    DOIs
    Publication statusPublished - 2004 Sept

    Publication series

    NamePhysica Status Solidi (A) Applied Research
    PublisherWiley-VCH Verlag
    ISSN (Print)0031-8965

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Electronic, Optical and Magnetic Materials

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