Pulsed laser deposited Na0.5K0.5NbO3 thin films

Chong Rae Cho; Alex Grishin; Byung Moo Moon

Pulsed laser deposited Na_0.5K_0.5NbO₃ thin films

Chong Rae Cho, Alex Grishin, Byung Moo Moon

Research output: Contribution to journal › Conference article › peer-review

Abstract

Na_0.5K_0.5NbO₃ films have been grown onto polycrystalline Pt₈₀Ir₂₀ substrates at two different regimes: high (approx. 400 m Torr) and low (approx. 10 mTorr) oxygen pressure. Films grown at high oxygen pressure have been found to be single phase and highly c-axis oriented. The concept of discriminated thermalization has been developed to explain the dynamics of the laser ablation process and to find reliable pulsed laser deposition (PLD) processing conditions. The phenomenon of self assembling of Na_0.5K_0.5NbO₃ films along [001] direction has been observed. On the other hand, films grown at low oxygen pressure have been found to be mixed phase of ferroelectric Na_0.5K_0.5NbO₃ and paraelectric potassium niobates. Superparaelectric behavior has been observed in these films: 5% tunability at electric field of 100 kV/cm, losses as low as 0.003 and excellent stability to the temperature and frequency changes.

Original language	English
Pages (from-to)	149-154
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	603
Publication status	Published - 2000
Event	Materials issues for Tunable RF and Microwave Devices - Boston, MA, USA Duration: 1999 Nov 30 → 1999 Dec 2

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Cite this

@article{6c47bba818fb43f99e7b442d12232c6a,

title = "Pulsed laser deposited Na0.5K0.5NbO3 thin films",

abstract = "Na0.5K0.5NbO3 films have been grown onto polycrystalline Pt80Ir20 substrates at two different regimes: high (approx. 400 m Torr) and low (approx. 10 mTorr) oxygen pressure. Films grown at high oxygen pressure have been found to be single phase and highly c-axis oriented. The concept of discriminated thermalization has been developed to explain the dynamics of the laser ablation process and to find reliable pulsed laser deposition (PLD) processing conditions. The phenomenon of self assembling of Na0.5K0.5NbO3 films along [001] direction has been observed. On the other hand, films grown at low oxygen pressure have been found to be mixed phase of ferroelectric Na0.5K0.5NbO3 and paraelectric potassium niobates. Superparaelectric behavior has been observed in these films: 5% tunability at electric field of 100 kV/cm, losses as low as 0.003 and excellent stability to the temperature and frequency changes.",

author = "Cho, {Chong Rae} and Alex Grishin and Moon, {Byung Moo}",

year = "2000",

language = "English",

volume = "603",

pages = "149--154",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Materials issues for Tunable RF and Microwave Devices ; Conference date: 30-11-1999 Through 02-12-1999",

}

TY - JOUR

T1 - Pulsed laser deposited Na0.5K0.5NbO3 thin films

AU - Cho, Chong Rae

AU - Grishin, Alex

AU - Moon, Byung Moo

PY - 2000

Y1 - 2000

N2 - Na0.5K0.5NbO3 films have been grown onto polycrystalline Pt80Ir20 substrates at two different regimes: high (approx. 400 m Torr) and low (approx. 10 mTorr) oxygen pressure. Films grown at high oxygen pressure have been found to be single phase and highly c-axis oriented. The concept of discriminated thermalization has been developed to explain the dynamics of the laser ablation process and to find reliable pulsed laser deposition (PLD) processing conditions. The phenomenon of self assembling of Na0.5K0.5NbO3 films along [001] direction has been observed. On the other hand, films grown at low oxygen pressure have been found to be mixed phase of ferroelectric Na0.5K0.5NbO3 and paraelectric potassium niobates. Superparaelectric behavior has been observed in these films: 5% tunability at electric field of 100 kV/cm, losses as low as 0.003 and excellent stability to the temperature and frequency changes.

AB - Na0.5K0.5NbO3 films have been grown onto polycrystalline Pt80Ir20 substrates at two different regimes: high (approx. 400 m Torr) and low (approx. 10 mTorr) oxygen pressure. Films grown at high oxygen pressure have been found to be single phase and highly c-axis oriented. The concept of discriminated thermalization has been developed to explain the dynamics of the laser ablation process and to find reliable pulsed laser deposition (PLD) processing conditions. The phenomenon of self assembling of Na0.5K0.5NbO3 films along [001] direction has been observed. On the other hand, films grown at low oxygen pressure have been found to be mixed phase of ferroelectric Na0.5K0.5NbO3 and paraelectric potassium niobates. Superparaelectric behavior has been observed in these films: 5% tunability at electric field of 100 kV/cm, losses as low as 0.003 and excellent stability to the temperature and frequency changes.

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M3 - Conference article

AN - SCOPUS:0033678126

SN - 0272-9172

VL - 603

SP - 149

EP - 154

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Materials issues for Tunable RF and Microwave Devices

Y2 - 30 November 1999 through 2 December 1999

ER -

Pulsed laser deposited Na_0.5K_0.5NbO₃ thin films

Abstract

ASJC Scopus subject areas

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