Purification of chemical mechanical polishing wastewater via superconducting high gradient magnetic separation system with optimal coagulation process

Young Gyun Kim, Jung Bin Song, Dong Gyu Yang, Woo Jin Kim, Sang Hyun Kim, Haigun Lee*

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    12 Citations (Scopus)

    Abstract

    This study examined the purification of wastewater from the chemical mechanical polishing (CMP) process via a superconducting high gradient magnetic separation (HGMS) system. To remove silica, the main contaminant in CMP wastewater, the optimal coagulation process of silica-magnetite-ferric hydroxide aggregates was empirically determined. Filtration tests via superconducting HGMS system with optimal coagulation process were conducted with respect to the magnetic field and wastewater flow rate. The turbidity and Si concentration of the wastewater filtered at 2 T and 400 mL/min were in accordance with the grey water standard and reverse osmosis (RO) feed water requirement, which demonstrated the feasibility of the superconducting HGMS system for the purification of CMP wastewater.

    Original languageEnglish
    Article number6937149
    JournalIEEE Transactions on Applied Superconductivity
    Volume25
    Issue number3
    DOIs
    Publication statusPublished - 2015 Jun 1

    Bibliographical note

    Publisher Copyright:
    © 2014 IEEE.

    Keywords

    • Chemical mechanical polishing
    • filtration
    • high gradient magnetic separation
    • wastewater

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics
    • Electrical and Electronic Engineering

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