Abstract
Efficiency and lifetime of GaN based light emitting diodes and laser diodes can be improved by proper choice of substrate or deliberate modification of the substrate surface before deposition. Buffer growth or nitridation is the usual choices of surface modifications for GaN deposition to improve crystal quality and optical properties. It was our intention to study a possibility that a reactive ion beam (RIB) pretreatment of the sapphire substrate at room temperature could substitute the nitridation process at high temperature above 1000°C. The optical property of GaN films deposited on the sapphire surfaces pretreated by the reactive ion beam has improved significantly. Current observations clearly demonstrates that the RIB pretreatment of the sapphire surface can be used to improve the GaN films grown by metal-organic chemical vapor deposition (MOCVD).
| Original language | English |
|---|---|
| Pages (from-to) | 151-153 |
| Number of pages | 3 |
| Journal | Thin Solid Films |
| Volume | 326 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 1998 Aug 4 |
Bibliographical note
Funding Information:This work was supported through KIST-2000 Research Program (Grant No. aV00253) and Korea University Research Grant. The authors would like to thank Dr. C.-H. Hong at LG Electronics Research Center, and Prof. T.-W. Kang at Dongguk University for their technical support and discussions.
Copyright:
Copyright 2018 Elsevier B.V., All rights reserved.
Keywords
- Atomic force microscopy
- Chemical vapor deposition
- Gallium nitride
- Reactive ion beam
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry