Realization of highly transparent and low resistance TiO2/Ag/TiO2 conducting electrode for optoelectronic devices

Jun Ho Kim, Dae Hyun Kim, Tae Yeon Seong

Research output: Contribution to journalArticlepeer-review

33 Citations (Scopus)


The effect of TiO2 thickness on the optical and electrical properties of TiO2/Ag/TiO2 multilayer films deposited on glass substrates was investigated. The as-deposited TiO2 samples were found to be amorphous. The transmission window became wider and gradually shifted toward lower energies as the TiO2 thickness increased from 10 to 50 nm. In particular, the TiO2/Ag/TiO2 (40 nm/18.8 nm/40 nm) multilayer film exhibited a transmittance of ~ 95% at 550 nm. Incrementally increasing the TiO2 thickness to 50 nm gradually decreased the carrier concentration to 6.1×1021 cm-3, while the charge mobility varied from 22.3 to 20.4 cm2 V-1 s-1. In addition, when increasing the TiO2 thickness to 50 nm, the samples showed similar sheet resistances of 3.9-4.4 Ω/, but the resistivity increased by a factor of 3.8. Haacke's figure of merit (FOM) was calculated for the samples and plotted as a function of TiO2 thickness; the TiO2 (40 nm)/Ag (18.8 nm)/TiO2 (40 nm) multilayer yielded the highest FOM of 159.9×10-3 Ω-1.

Original languageEnglish
Pages (from-to)3064-3068
Number of pages5
JournalCeramics International
Issue number2
Publication statusPublished - 2015 Mar 1

Bibliographical note

Funding Information:
This work was supported by the Brain Korea 21 plus program through the National Research Foundation (NRF) funded by the Ministry of Education of Korea.

Publisher Copyright:
© 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved.


  • Ag
  • Multilayer
  • TiO
  • Transparent conducting electrode

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry


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