Abstract
The colors of thin and thick layers of graphene and graphene oxide films on either SiO2 or Si3N4 grown silicon substrates were generated by a theoretical calculation procedure. The effects of the thicknesses of the material and the dielectric layers on the visibility of the graphenebased materials were investigated. The theoretical investigation was supplemented by measurements of the thicknesses of the material layers using either an atomic force microscope or a profilometer, depending on the thickness range. By combining the color calculation procedure with the measured thickness profiles, optical images of graphene-based materials on dielectric substrates can be reconstructed. The reconstructed image corresponds well to the real microscope image, which suggests that the image reconstruction procedure is a convenient way to investigate colors and determine the thickness of graphene-based materials.
Original language | English |
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Article number | 023601 |
Journal | Optical Engineering |
Volume | 52 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2013 |
Externally published | Yes |
Bibliographical note
Funding Information:This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2011-0013066).
Keywords
- Color calculation
- Graphene
- Graphene oxide
- Visibility
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- General Engineering