Reduction of dislocation density in mismatched SiGe/Si using a low-temperature Si buffer layer
- K. K. Linder*
- , F. C. Zhang
- , J. S. Rieh
- , P. Bhattacharya
- , D. Houghton
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
113
Link opens in a new tab
Citations
(Scopus)