Reduction of residual carbon in GaAsN films grown by chemical beam epitaxy

Hidetoshi Suzuki, Kenichi Nishimura, Hae Seok Lee, Kenji Saito, Tetsuya Kawahigashi, Takahiro Imai, Yoshio Ohshita, Masafumi Yamaguchi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science

Chemical Compounds