Remote plasma atomic layer deposited Al2O3 4H SiC MOS capacitor with remote H2 plasma passivation and post metallization annealing

Seung Chan Heo, Donghwan Lim, Woo Suk Jung, Rino Choi, Hyun Yong Yu, Changhwan Choi

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds

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