Repairable Macroscopic Monodomain Arrays from Block Copolymers Enabled by Photoplastic and Photodielectric Effects

Hui Il Jeon, Seungyun Jo, Seungbae Jeon, Taesuk Jun, Jungwoo Moon, Jeong Ho Cho, Hyungju Ahn, Seungwoo Lee, Du Yeol Ryu, Thomas P. Russell

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Upon exposure to UV light (120 mW/cm2, λ = 365 nm), a trans-cis isomerization occurs in a cylinder-forming, azobenzene-containing block copolymer of polydimethylsiloxane-b-poly((4(phenyldiazenyl)phenoxy)hexyl acrylate) (PDMS-b-PPHA) that enables the generation of monodomains of healable, long-range ordered arrays of nanoscopic domains over macroscopic distances. The trans-cis isomerization gives rise to a significant increase in the dielectric constant (from 6.52 to 19.8 at 100 Hz, photodielectric behavior) and a dramatic decrease in the Tg (from 54 to 1 °C, photoplastic behavior) of the PPHA block. By combining these characteristics with an in-plane electric field, macroscopic monodomains of near-perfectly aligned cylindrical microdomains are achieved at low temperatures, and a damage repair is clearly uncovered, where the 300 nm wide scratches can be completely healed at 40 °C, leaving a smooth, uniformly thick film where the continuity and orientation of the aligned microdomains are restored. Subsequent exposure to visible light causes a cis-trans isomerization, increasing the matrix Tg to 54 °C, producing highly oriented and aligned PDMS cylindrical microdomains in a PPHA matrix.

Original languageEnglish
Pages (from-to)8367-8375
Number of pages9
JournalACS nano
Volume17
Issue number9
DOIs
Publication statusPublished - 2023 May 9

Bibliographical note

Funding Information:
This work was supported by the Samsung Research Funding Center for Samsung Electronics under Project Number SRFC-MA1801-04 and the NRF Grants (2021R1A2C2006588, 2022R1A4A1020543) funded by the Ministry of Science, ICT & Future Planning (MSIP), Korea. T.P.R. was supported by the Air Force Office of Scientific Research under contract numbers of 21RT0488.

Publisher Copyright:
© 2023 American Chemical Society.

Keywords

  • azobenzene-containing block copolymers
  • electric field
  • long-ranged nanopatterning
  • photoplastic directed self-assembly

ASJC Scopus subject areas

  • General Materials Science
  • General Engineering
  • General Physics and Astronomy

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