Replication of high ordered nano-sphere array by nanoimprint lithography

Sung Hoon Hong, Byeong Ju Bae, Jae Yeon Hwang, Seon Yong Hwang, Heon Lee

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)


High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate.

Original languageEnglish
Pages (from-to)2423-2426
Number of pages4
JournalMicroelectronic Engineering
Issue number12
Publication statusPublished - 2009 Dec

Bibliographical note

Funding Information:
This work is supported by the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund) (KRF-2006-003-D00266) and the Ministry of Knowledge Economy (MKE) and Korea Industrial Technology Foundation (KOTEF) through the Human Resource Training Project for Strategic Technology.


  • DLC coating
  • Flexible polymer template
  • Hot embossing
  • UV nanoimprint lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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