Replication of high ordered nano-sphere array by nanoimprint lithography

Sung Hoon Hong; Byeong Ju Bae; Jae Yeon Hwang; Seon Yong Hwang; Heon Lee

doi:10.1016/j.mee.2009.05.005

Replication of high ordered nano-sphere array by nanoimprint lithography

Sung Hoon Hong, Byeong Ju Bae, Jae Yeon Hwang, Seon Yong Hwang, Heon Lee

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate.

Original language	English
Pages (from-to)	2423-2426
Number of pages	4
Journal	Microelectronic Engineering
Volume	86
Issue number	12
DOIs	https://doi.org/10.1016/j.mee.2009.05.005
Publication status	Published - 2009 Dec

Bibliographical note

Funding Information:
This work is supported by the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund) (KRF-2006-003-D00266) and the Ministry of Knowledge Economy (MKE) and Korea Industrial Technology Foundation (KOTEF) through the Human Resource Training Project for Strategic Technology.

Keywords

DLC coating
Flexible polymer template
Hot embossing
UV nanoimprint lithography

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

Access to Document

10.1016/j.mee.2009.05.005

Cite this

@article{cef53e1c53e24aefabad37bcb1ed6568,

title = "Replication of high ordered nano-sphere array by nanoimprint lithography",

abstract = "High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate.",

keywords = "DLC coating, Flexible polymer template, Hot embossing, UV nanoimprint lithography",

author = "Hong, {Sung Hoon} and Bae, {Byeong Ju} and Hwang, {Jae Yeon} and Hwang, {Seon Yong} and Heon Lee",

note = "Funding Information: This work is supported by the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund) (KRF-2006-003-D00266) and the Ministry of Knowledge Economy (MKE) and Korea Industrial Technology Foundation (KOTEF) through the Human Resource Training Project for Strategic Technology.",

year = "2009",

month = dec,

doi = "10.1016/j.mee.2009.05.005",

language = "English",

volume = "86",

pages = "2423--2426",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

number = "12",

}

TY - JOUR

T1 - Replication of high ordered nano-sphere array by nanoimprint lithography

AU - Hong, Sung Hoon

AU - Bae, Byeong Ju

AU - Hwang, Jae Yeon

AU - Hwang, Seon Yong

AU - Lee, Heon

N1 - Funding Information: This work is supported by the Korea Research Foundation Grant funded by the Korean Government (MOEHRD, Basic Research Promotion Fund) (KRF-2006-003-D00266) and the Ministry of Knowledge Economy (MKE) and Korea Industrial Technology Foundation (KOTEF) through the Human Resource Training Project for Strategic Technology.

PY - 2009/12

Y1 - 2009/12

N2 - High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate.

AB - High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate.

KW - DLC coating

KW - Flexible polymer template

KW - Hot embossing

KW - UV nanoimprint lithography

UR - http://www.scopus.com/inward/record.url?scp=70349769297&partnerID=8YFLogxK

U2 - 10.1016/j.mee.2009.05.005

DO - 10.1016/j.mee.2009.05.005

M3 - Article

AN - SCOPUS:70349769297

SN - 0167-9317

VL - 86

SP - 2423

EP - 2426

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 12

ER -

Replication of high ordered nano-sphere array by nanoimprint lithography

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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