Role of a Mo interlayer on the thermal stability of nickel silicides

Y. W. Ok; C. J. Choi; T. Y. Seong; C. Thanachayanont

Role of a Mo interlayer on the thermal stability of nickel silicides

Y. W. Ok^*
, C. J. Choi
, T. Y. Seong
, C. Thanachayanont

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

Abstract

We investigate the effect of a Mo interlayer on the thermal stability of nickel suicides. Glancing angle x-ray diffraction results show that NiSi is transformed into NiSi₂ at temperatures in excess of 700°C, at which the tetragonal MoSi₂ phase is also formed. It is shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. It is also shown that the use of the interlayer is effective in improving the surface morphology of the suicide films and the uniformity of the silicide/Si interface.

Original language	English
Pages (from-to)	475-478
Number of pages	4
Journal	Design and Nature
Volume	6
Publication status	Published - 2004
Externally published	Yes
Event	Design and Nature II: Comparing Design in Nature with Science and Engineering - Rhodes, Greece Duration: 2004 Jun 28 → 2004 Jun 30

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 3 Good Health and Well-being

ASJC Scopus subject areas

General Engineering

Cite this

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title = "Role of a Mo interlayer on the thermal stability of nickel silicides",

abstract = "We investigate the effect of a Mo interlayer on the thermal stability of nickel suicides. Glancing angle x-ray diffraction results show that NiSi is transformed into NiSi2 at temperatures in excess of 700°C, at which the tetragonal MoSi2 phase is also formed. It is shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. It is also shown that the use of the interlayer is effective in improving the surface morphology of the suicide films and the uniformity of the silicide/Si interface.",

author = "Ok, \{Y. W.\} and Choi, \{C. J.\} and Seong, \{T. Y.\} and C. Thanachayanont",

year = "2004",

language = "English",

volume = "6",

pages = "475--478",

journal = "Design and Nature",

issn = "1478-0585",

publisher = "WITPress",

note = "Design and Nature II: Comparing Design in Nature with Science and Engineering ; Conference date: 28-06-2004 Through 30-06-2004",

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TY - JOUR

T1 - Role of a Mo interlayer on the thermal stability of nickel silicides

AU - Ok, Y. W.

AU - Choi, C. J.

AU - Seong, T. Y.

AU - Thanachayanont, C.

PY - 2004

Y1 - 2004

N2 - We investigate the effect of a Mo interlayer on the thermal stability of nickel suicides. Glancing angle x-ray diffraction results show that NiSi is transformed into NiSi2 at temperatures in excess of 700°C, at which the tetragonal MoSi2 phase is also formed. It is shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. It is also shown that the use of the interlayer is effective in improving the surface morphology of the suicide films and the uniformity of the silicide/Si interface.

AB - We investigate the effect of a Mo interlayer on the thermal stability of nickel suicides. Glancing angle x-ray diffraction results show that NiSi is transformed into NiSi2 at temperatures in excess of 700°C, at which the tetragonal MoSi2 phase is also formed. It is shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. It is also shown that the use of the interlayer is effective in improving the surface morphology of the suicide films and the uniformity of the silicide/Si interface.

UR - https://www.scopus.com/pages/publications/7744222910

M3 - Conference article

AN - SCOPUS:7744222910

SN - 1478-0585

VL - 6

SP - 475

EP - 478

JO - Design and Nature

JF - Design and Nature

T2 - Design and Nature II: Comparing Design in Nature with Science and Engineering

Y2 - 28 June 2004 through 30 June 2004

ER -

Role of a Mo interlayer on the thermal stability of nickel silicides

Abstract

UN SDGs

ASJC Scopus subject areas

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