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Role of a Mo interlayer on the thermal stability of nickel silicides
Y. W. Ok
*
, C. J. Choi
,
T. Y. Seong
, C. Thanachayanont
*
Corresponding author for this work
Research output
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Conference article
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peer-review
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Keyphrases
Annealing
50%
Diffraction
50%
Glancing Angle
50%
Mo Interlayer
100%
MoSi2
50%
Nickel Silicide
100%
NiSi
50%
NiSi2
50%
Silicide
50%
Suicide
100%
Surface Morphology
50%
Surface Zone
50%
Tetragonal
50%
Thermal Stability
100%
Material Science
Film
50%
Silicide
100%
Surface (Surface Science)
50%
Surface Morphology
50%
Thermal Stability
100%
Earth and Planetary Sciences
Interlayer
100%
Silicide
100%
Thermal Stability
100%
Engineering
Glancing Angle
33%
Interlayer
100%
Ray Diffraction
33%
Si Interface
33%
Surface Morphology
33%
Surface Region
33%