Secondary electron generation in electron-beam-irradiated solids: Resolution limits to nanolithography

Kyu Won Lee; S. M. Yoon; S. C. Lee; W. Lee; I. M. Kim; Cheol Eui Lee; D. H. Kim

doi:10.3938/jkps.55.1720

Secondary electron generation in electron-beam-irradiated solids: Resolution limits to nanolithography

Kyu Won Lee, S. M. Yoon, S. C. Lee, W. Lee, I. M. Kim, Cheol Eui Lee, D. H. Kim

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

Abstract

We have investigated the secondary electron generation in electron-beam-irradiated solids by means of a Monte Carlo simulation. The slow secondary electron energy was found to be independent of the position and the incident energy of the electron beam, and the electron beam broadening in thin films due to secondary electrons was found to be at least 5-10 nm, setting limits to the nanolithographic resolution.

Original language	English
Pages (from-to)	1720-1723
Number of pages	4
Journal	Journal of the Korean Physical Society
Volume	55
Issue number	4
DOIs	https://doi.org/10.3938/jkps.55.1720
Publication status	Published - 2009 Oct

Keywords

Electron-beam nanolithography
Monte Carlo simulation
Secondary electron generation

ASJC Scopus subject areas

General Physics and Astronomy

Access to Document

10.3938/jkps.55.1720

Cite this

@article{442719ed6e914fb8ae20a1e1fa408d91,

title = "Secondary electron generation in electron-beam-irradiated solids: Resolution limits to nanolithography",

abstract = "We have investigated the secondary electron generation in electron-beam-irradiated solids by means of a Monte Carlo simulation. The slow secondary electron energy was found to be independent of the position and the incident energy of the electron beam, and the electron beam broadening in thin films due to secondary electrons was found to be at least 5-10 nm, setting limits to the nanolithographic resolution.",

keywords = "Electron-beam nanolithography, Monte Carlo simulation, Secondary electron generation",

author = "Lee, {Kyu Won} and Yoon, {S. M.} and Lee, {S. C.} and W. Lee and Kim, {I. M.} and Lee, {Cheol Eui} and Kim, {D. H.}",

year = "2009",

month = oct,

doi = "10.3938/jkps.55.1720",

language = "English",

volume = "55",

pages = "1720--1723",

journal = "Journal of the Korean Physical Society",

issn = "0374-4884",

publisher = "Korean Physical Society",

number = "4",

}

TY - JOUR

T1 - Secondary electron generation in electron-beam-irradiated solids

T2 - Resolution limits to nanolithography

AU - Lee, Kyu Won

AU - Yoon, S. M.

AU - Lee, S. C.

AU - Lee, W.

AU - Kim, I. M.

AU - Lee, Cheol Eui

AU - Kim, D. H.

PY - 2009/10

Y1 - 2009/10

N2 - We have investigated the secondary electron generation in electron-beam-irradiated solids by means of a Monte Carlo simulation. The slow secondary electron energy was found to be independent of the position and the incident energy of the electron beam, and the electron beam broadening in thin films due to secondary electrons was found to be at least 5-10 nm, setting limits to the nanolithographic resolution.

AB - We have investigated the secondary electron generation in electron-beam-irradiated solids by means of a Monte Carlo simulation. The slow secondary electron energy was found to be independent of the position and the incident energy of the electron beam, and the electron beam broadening in thin films due to secondary electrons was found to be at least 5-10 nm, setting limits to the nanolithographic resolution.

KW - Electron-beam nanolithography

KW - Monte Carlo simulation

KW - Secondary electron generation

UR - http://www.scopus.com/inward/record.url?scp=72149103805&partnerID=8YFLogxK

U2 - 10.3938/jkps.55.1720

DO - 10.3938/jkps.55.1720

M3 - Article

AN - SCOPUS:72149103805

SN - 0374-4884

VL - 55

SP - 1720

EP - 1723

JO - Journal of the Korean Physical Society

JF - Journal of the Korean Physical Society

IS - 4

ER -

Secondary electron generation in electron-beam-irradiated solids: Resolution limits to nanolithography

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this