Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithography

Ki Yeon Yang; Jong Woo Kim; Kyeong Jae Byeon; Heon Lee

doi:10.1016/j.mee.2007.01.159

Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithography

Ki Yeon Yang, Jong Woo Kim, Kyeong Jae Byeon, Heon Lee

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

In order to utilize Ag nano-particles into micro-nano-devices, they need to be selectively deposited as a sub-micrometer scale to form the patterns. Self-assembled monolayer (SAM) can modify the surface properties of substrate according to its terminal functional groups. Especially, the hydrophobic SAM can drastically reduce the surface energy of substrate and it may be applied to the various selective deposition applications. In this study, the trichlorosilane based hydrophobic SAM was patterned by the zero-residual layer nano-imprint lithography and Ag nano-particles were selectively deposited to form a sub-micrometer sized patterns.

Original language	English
Pages (from-to)	1552-1555
Number of pages	4
Journal	Microelectronic Engineering
Volume	84
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2007.01.159
Publication status	Published - 2007 May

Bibliographical note

Funding Information:
This work was supported in part by MIC and IITA through IT Leading R&D Support Project. The authors thank Government for financial supports and Korea Sanhak Foundation in 2006.

Keywords

Nano-imprint lithography
SAM pattern
Selective deposition
Silver nano-particle

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mee.2007.01.159

Cite this

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title = "Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithography",

abstract = "In order to utilize Ag nano-particles into micro-nano-devices, they need to be selectively deposited as a sub-micrometer scale to form the patterns. Self-assembled monolayer (SAM) can modify the surface properties of substrate according to its terminal functional groups. Especially, the hydrophobic SAM can drastically reduce the surface energy of substrate and it may be applied to the various selective deposition applications. In this study, the trichlorosilane based hydrophobic SAM was patterned by the zero-residual layer nano-imprint lithography and Ag nano-particles were selectively deposited to form a sub-micrometer sized patterns.",

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note = "Funding Information: This work was supported in part by MIC and IITA through IT Leading R&D Support Project. The authors thank Government for financial supports and Korea Sanhak Foundation in 2006.",

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AU - Kim, Jong Woo

AU - Byeon, Kyeong Jae

AU - Lee, Heon

N1 - Funding Information: This work was supported in part by MIC and IITA through IT Leading R&D Support Project. The authors thank Government for financial supports and Korea Sanhak Foundation in 2006.

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N2 - In order to utilize Ag nano-particles into micro-nano-devices, they need to be selectively deposited as a sub-micrometer scale to form the patterns. Self-assembled monolayer (SAM) can modify the surface properties of substrate according to its terminal functional groups. Especially, the hydrophobic SAM can drastically reduce the surface energy of substrate and it may be applied to the various selective deposition applications. In this study, the trichlorosilane based hydrophobic SAM was patterned by the zero-residual layer nano-imprint lithography and Ag nano-particles were selectively deposited to form a sub-micrometer sized patterns.

AB - In order to utilize Ag nano-particles into micro-nano-devices, they need to be selectively deposited as a sub-micrometer scale to form the patterns. Self-assembled monolayer (SAM) can modify the surface properties of substrate according to its terminal functional groups. Especially, the hydrophobic SAM can drastically reduce the surface energy of substrate and it may be applied to the various selective deposition applications. In this study, the trichlorosilane based hydrophobic SAM was patterned by the zero-residual layer nano-imprint lithography and Ag nano-particles were selectively deposited to form a sub-micrometer sized patterns.

KW - Nano-imprint lithography

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KW - Selective deposition

KW - Silver nano-particle

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Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithography

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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