Skip to main navigation
Skip to search
Skip to main content
Korea University Pure Home
Home
Profiles
Research units
Equipment
Research output
Press/Media
Search by expertise, name or affiliation
Selective electrochemical etching of epitaxial aluminum nitride thin film
Yongha Choi
, Rakjun Choi
, Jihyun Kim
*
*
Corresponding author for this work
Research output
:
Contribution to journal
›
Article
›
peer-review
15
Citations (Scopus)
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Selective electrochemical etching of epitaxial aluminum nitride thin film'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Keyphrases
Epitaxial
100%
Nitrides
100%
Selective Electrochemical Etching
100%
Aluminum Nitride Thin Film
100%
Etching Rate
80%
Electrochemical Etching
60%
Spatial Selectivity
40%
Low Damage
20%
Device Fabrication
20%
Dry Etching
20%
Chemical Etching
20%
Band Gap Energy
20%
Metal Electrode
20%
Fabrication Methods
20%
Facile Method
20%
Epitaxial Layers
20%
Non-porous
20%
Etchant
20%
Phosphoric Acid
20%
Etch pit
20%
Hexagonal Pyramid
20%
Pyramid Structure
20%
High Chemical Stability
20%
Porous Metal Electrode
20%
Ultra-wide Bandgap
20%
Anode Bias
20%
Material Science
Thin Films
100%
Aluminum Nitride
100%
Electrochemical Etching
100%
Dry Etching
16%
Device Fabrication
16%
Oxidation Reaction
16%
Epitaxial Film
16%