Selective electrochemical etching of epitaxial aluminum nitride thin film

Keyphrases

• Epitaxial 100%
• Nitrides 100%
• Selective Electrochemical Etching 100%
• Aluminum Nitride Thin Film 100%
• Etching Rate 80%
• Electrochemical Etching 60%
• Spatial Selectivity 40%
• Low Damage 20%
• Device Fabrication 20%
• Dry Etching 20%
• Chemical Etching 20%
• Band Gap Energy 20%
• Metal Electrode 20%
• Fabrication Methods 20%
• Facile Method 20%
• Epitaxial Layers 20%
• Non-porous 20%
• Etchant 20%
• Phosphoric Acid 20%
• Etch pit 20%
• Hexagonal Pyramid 20%
• Pyramid Structure 20%
• High Chemical Stability 20%
• Porous Metal Electrode 20%
• Ultra-wide Bandgap 20%
• Anode Bias 20%

Material Science

• Thin Films 100%
• Aluminum Nitride 100%
• Electrochemical Etching 100%
• Dry Etching 16%
• Device Fabrication 16%
• Oxidation Reaction 16%
• Epitaxial Film 16%