Abstract
We reported a new technique for self-assembly of selective placement of carbon nanotubes (CNT) on pre- defined micro-patterns. Our work based on the use of a poly-para-xylylene C passivation layer on silicon dioxide (SiO2) surface which was micro-patterned by reactive ion etching (RIE) process and follow by the CNT deposition step. The lift-off of poly-para-xylylene layer then was carried out relying on a dry lift-off method in order to remove the nanotubes adsorbed on the poly-para-xylylene layer leaving the CNT on the desirable areas. CNT located at specific micro-areas with pre-defined patterns from 50 μm down to less than 10 μm line width and variable shapes. This approach provides a simple and useful means allow controlled placement of CNT which is necessary for the large-scale fabrication of electronic devices.
Original language | English |
---|---|
Pages (from-to) | S38-S42 |
Journal | Current Applied Physics |
Volume | 9 |
Issue number | 1 SUPPL. |
DOIs | |
Publication status | Published - 2009 Jan |
Keywords
- Deposition
- Dry lift-off removal
- Micro-scale patterns
- Nanomaterial
- Poly-para-xylylene C
ASJC Scopus subject areas
- Materials Science(all)
- Physics and Astronomy(all)