Abstract
We reported a new technique for self-assembly of selective placement of carbon nanotubes (CNT) on pre- defined micro-patterns. Our work based on the use of a poly-para-xylylene C passivation layer on silicon dioxide (SiO2) surface which was micro-patterned by reactive ion etching (RIE) process and follow by the CNT deposition step. The lift-off of poly-para-xylylene layer then was carried out relying on a dry lift-off method in order to remove the nanotubes adsorbed on the poly-para-xylylene layer leaving the CNT on the desirable areas. CNT located at specific micro-areas with pre-defined patterns from 50 μm down to less than 10 μm line width and variable shapes. This approach provides a simple and useful means allow controlled placement of CNT which is necessary for the large-scale fabrication of electronic devices.
Original language | English |
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Pages (from-to) | S38-S42 |
Journal | Current Applied Physics |
Volume | 9 |
Issue number | 1 SUPPL. |
DOIs | |
Publication status | Published - 2009 Jan |
Bibliographical note
Funding Information:This work was supported by the National Research Laboratory NRL, (R0A-2007-000-20111-0) Program of the Ministry of Science and Technology in Korea Science and partially supported by the IT R&D program of MKE/IITA [2006-S-078-03, Environmental Sensing and Alerting System with Nano-wire and Nano-tube], We thank government for financial supports.
Keywords
- Deposition
- Dry lift-off removal
- Micro-scale patterns
- Nanomaterial
- Poly-para-xylylene C
ASJC Scopus subject areas
- General Materials Science
- General Physics and Astronomy