Material Science
Chemical Vapor Deposition
100%
Silicon
100%
Density
66%
Photoluminescence
66%
Cathodoluminescence
66%
Energy-Dispersive X-Ray Spectroscopy
66%
Single Crystal
66%
Thin Films
33%
Film Thickness
33%
Surface Morphology
33%
Optical Property
33%
Scanning Electron Microscopy
33%
Gallium
33%
Scanning Electron Microscopy-Energy Dispersive X-Ray
33%
Surface (Surface Science)
33%
Phase Composition
33%
Keyphrases
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
Nanocolumns
100%
Si(111) Substrate
100%
Seeding Method
100%
Ga-based Alloy
100%
Single Crystal
20%
Cathodoluminescence
20%
Low Dislocation Density
20%
Column Array
20%
Au Thin Film
10%
Photoluminescence
10%
Surface Morphology
10%
Chemical Composition
10%
Optical Properties
10%
Scanning Electron Microscope Image
10%
Silicon Substrate
10%
Morphological Properties
10%
Photoluminescence Spectra
10%
Device Performance
10%
Energy Dispersive X-ray Spectroscopy
10%
Uniformly Distributed
10%
As-grown
10%
Silicon Surface
10%
Nitrogen Ions
10%
Vertical Growth
10%
Scanning Electron Microscopy/energy Dispersive Spectroscopy
10%
Full Width at Half Maximum
10%
Band-edge Emission
10%
Growth Parameters
10%
Alloy Droplet
10%
Thin Film Thickness
10%
Optical Quality
10%
Gallium Ions
10%
Silicon(111)
10%
Engineering
Energy Engineering
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Dislocation Density
100%
Thin Films
50%
Surface Morphology
50%
Band Edge
50%
Device Performance
50%
Silicon Substrate
50%
Silicon Surface
50%
Growth Parameter
50%
Optical Quality
50%