Shear-Rolling Process for Unidirectionally and Perpendicularly Oriented Sub-10-nm Block Copolymer Patterns on the 4 in Scale

Jinwoo Oh, Minkyung Shin, In Soo Kim, Hyo Seon Suh, Yongjoo Kim, Jai Kyeong Kim, Joona Bang, Bongjun Yeom, Jeong Gon Son

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)


Shear alignment of the block copolymer (BCP) thin film is one of the promising directed self-Assembly (DSA) methodologies for the unidirectional alignment of sub-10 nm microdomains of BCPs for next-generation nanolithography and nanowire-grid polarizers. However, because of the differences in the surface/interfacial energies at the top surface/bottom interface, the shear-induced ordering of BCP nanopatterns has been restricted to BCPs with spherical and cylindrical nanopatterns and cannot be realized for high-Aspect-ratio perpendicular lamellar structures, which is essential for practical application to semiconductor pattern processes. It is still a difficult challenge to fabricate the unidirectional alignment in a short time over a large area. In this study, we propose an approach for combining the shear-rolling process with the filtered plasma treatment of BCP films for the fabrication of unidirectionally aligned and perpendicularly oriented lamellar nanostructures. This approach enables fabrication within 1 min on a 4 in scale. We treated filtered plasma on the BCP film for perpendicular orientation and executed the hot-rolling process with different roller and stage speeds. Large-scale shear was generated only at the location where the BCP film was in contact with both the roller and stage, effectively applying shear stress to a large area of the BCP film within a short time. The repeated application of this shear-rolling process can achieve a higher level of unidirectional alignment. Our aligned BCP vertical lamellae were used to fabricate a high-Aspect-ratio sub-10-nm-wide metallic nanowire array via dry/wet processes. In addition, shear-rolling with chemoepitaxy patterns can achieve higher orientational order and lower defectivity.

Original languageEnglish
Pages (from-to)8549-8558
Number of pages10
JournalACS nano
Issue number5
Publication statusPublished - 2021 May 25

Bibliographical note

Funding Information:
We gratefully acknowledge financial support from the Korea Institute of Science and Technology (KIST) Institutional Program (project nos. 2E31161 and 2V08210) and the National Research Foundation of Korea (NRF) grant funded by the Ministry of Science and ICT (NRF-2019R1A2C2005657, Creative Materials Discovery Program 2020M3D1A1110499, 2020M3D1A2101799).

Publisher Copyright:


  • block copolymer
  • directed self-Assembly
  • directional alignment
  • filtered plasma
  • perpendicular orientation
  • shear-rolling
  • sub-10 nm patterning

ASJC Scopus subject areas

  • General Materials Science
  • General Engineering
  • General Physics and Astronomy


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