Silk-based organic photoresists for extreme ultraviolet lithography: a multiscale in silico study

Taeyoung Yoon, Wooboum Park, Yoonjung Kim, Hyunsung Choi, Soonchun Chung, Joonsong Park, Hyun Joon Chang, Sungsoo Na

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The development of photoresists (PRs) for extreme ultraviolet (EUV) lithography has become increasingly popular in the field of semiconductor nanopatterning. However, the rinsing process during sub-10 nm nanopatterning can severely impact the structural integrity of the existing PR materials; therefore, novel, robust PR materials are required. Here, we propose silk procured from silkworms as a potential PR for EUV lithography applications owing to its organic, biocompatible, and ecofriendly nature, and also its excellent mechanical properties. Its structural stability was examined using multiscale in silico methods, and its photoreactivity was evaluated via quantum mechanical calculations, and molecular dynamics simulations were performed to observe the silk peptide assembly behavior after EUV lithography. Moreover, an elastic network model was constructed, and normal mode analysis was conducted to approximate the mechanical properties of the assembled silk peptides. The data demonstrate how photoionization cleaved the covalent bonds between the Cα-Cβ atoms within tyrosine, which eventually destabilized the assembled silk peptides. In addition, the collapse of the secondary structure of the silk peptides after EUV lithography treatment indicated the instability of the self-assembled structure. Nevertheless, despite its organic nature, the photoionized silk exhibited a 25% increase in its Young's modulus compared with those of other PRs.

Original languageEnglish
Pages (from-to)4415-4425
Number of pages11
JournalJournal of Materials Chemistry C
Volume11
Issue number13
DOIs
Publication statusPublished - 2023 Feb 27

Bibliographical note

Funding Information:
This study was supported by the Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd. In addition, the simulation work was supported by the National Research Foundation of Korea grant funded by the Korean Government (NRF-2022-Fostering Core Leaders of the Future Basic Science Program/Global PhD Fellowship Program) (no. 2018H1A2A1062291), and by the Ministry of Science, ICT & Future Planning (NRF-2022R1A2B5B01001928).

Publisher Copyright:
© 2023 The Royal Society of Chemistry.

ASJC Scopus subject areas

  • General Chemistry
  • Materials Chemistry

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