Simple micro-scale selective patterning on a single nanowire by using an optical microscope

Dong Jin Oh; Boone Won; Kang Hyun Kim; Gyu Tae Kim

doi:10.1117/12.599540

Simple micro-scale selective patterning on a single nanowire by using an optical microscope

Dong Jin Oh, Boone Won, Kang Hyun Kim, Gyu Tae Kim

Research output: Contribution to journal › Conference article › peer-review

Abstract

A simple convenient way of forming a selective patterning on a single nanowire was demonstrated by using a conventional optical microscope. The fine resolution could reach approximately 5 μ m, which is enough to define electrode patterns on a single nanowire in a two-probe configuration. The photolithographic processes were carried out under the microscope with photoresist-coated substrate deposited by nanowires. Through the image capture and a proper configuration of the various home-made photomasks could produce a selective patterning on an individual nanowire successfully. Current-voltage characteristics of an individual GaN single nanowire were measured as a demonstration.

Original language	English
Article number	166
Pages (from-to)	1500-1507
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5754
Issue number	PART 3
DOIs	https://doi.org/10.1117/12.599540
Publication status	Published - 2005
Event	Optical Microlithography XVIII - San Jose, CA, United States Duration: 2005 Mar 1 → 2005 Mar 4

Keywords

Nanowire
Optical microscope
Photo lithography
Selective patterning

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.599540

Cite this

@article{5ee9bbaf517942378a95a09a6e30b12f,

title = "Simple micro-scale selective patterning on a single nanowire by using an optical microscope",

abstract = "A simple convenient way of forming a selective patterning on a single nanowire was demonstrated by using a conventional optical microscope. The fine resolution could reach approximately 5 μ m, which is enough to define electrode patterns on a single nanowire in a two-probe configuration. The photolithographic processes were carried out under the microscope with photoresist-coated substrate deposited by nanowires. Through the image capture and a proper configuration of the various home-made photomasks could produce a selective patterning on an individual nanowire successfully. Current-voltage characteristics of an individual GaN single nanowire were measured as a demonstration.",

keywords = "Nanowire, Optical microscope, Photo lithography, Selective patterning",

author = "Oh, {Dong Jin} and Boone Won and Kim, {Kang Hyun} and Kim, {Gyu Tae}",

year = "2005",

doi = "10.1117/12.599540",

language = "English",

volume = "5754",

pages = "1500--1507",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

number = "PART 3",

}

TY - JOUR

T1 - Simple micro-scale selective patterning on a single nanowire by using an optical microscope

AU - Oh, Dong Jin

AU - Won, Boone

AU - Kim, Kang Hyun

AU - Kim, Gyu Tae

PY - 2005

Y1 - 2005

N2 - A simple convenient way of forming a selective patterning on a single nanowire was demonstrated by using a conventional optical microscope. The fine resolution could reach approximately 5 μ m, which is enough to define electrode patterns on a single nanowire in a two-probe configuration. The photolithographic processes were carried out under the microscope with photoresist-coated substrate deposited by nanowires. Through the image capture and a proper configuration of the various home-made photomasks could produce a selective patterning on an individual nanowire successfully. Current-voltage characteristics of an individual GaN single nanowire were measured as a demonstration.

AB - A simple convenient way of forming a selective patterning on a single nanowire was demonstrated by using a conventional optical microscope. The fine resolution could reach approximately 5 μ m, which is enough to define electrode patterns on a single nanowire in a two-probe configuration. The photolithographic processes were carried out under the microscope with photoresist-coated substrate deposited by nanowires. Through the image capture and a proper configuration of the various home-made photomasks could produce a selective patterning on an individual nanowire successfully. Current-voltage characteristics of an individual GaN single nanowire were measured as a demonstration.

KW - Nanowire

KW - Optical microscope

KW - Photo lithography

KW - Selective patterning

UR - http://www.scopus.com/inward/record.url?scp=25144431800&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=25144431800&partnerID=8YFLogxK

U2 - 10.1117/12.599540

DO - 10.1117/12.599540

M3 - Conference article

AN - SCOPUS:25144431800

SN - 0277-786X

VL - 5754

SP - 1500

EP - 1507

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

IS - PART 3

M1 - 166

T2 - Optical Microlithography XVIII

Y2 - 1 March 2005 through 4 March 2005

ER -

Simple micro-scale selective patterning on a single nanowire by using an optical microscope

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this