Abstract
A new lateral trench insulated gate bipolar transistor (LTIGBT) with p+ diverter was proposed to improve the characteristics of the conventional LTIGBT. The p+ divert layer was placed between the anode electrode and the cathode electrode. Generally, as the conventional LTIGBT had a p+ divert region, the forward blocking voltage was decreased greatly because the n-drift layer corresponding to the punch-through region was reduced. However, the forward blocking voltage of the proposed LTIGBT with p+ diverter was about 140 V. That of the conventional LTIGBT of the same size was 105 V. Because the p+ diverter region of the proposed device was an enclosed trench oxide layer, the electric field moved toward the trench-oxide layer, and punch through breakdown of LTIGBT with p+ diverter occurred. Therefore, the p+ diverter of the proposed LTIGBT did not relate to breakdown voltage in a way different to the conventional LTIGBT. The latch-up current densities of the conventional LTIGBT and LTIGBT with p+ diverter were 540, and 1453 A/cm2, respectively. The enhanced latch-up capability of the proposed LTIGBT with p+ diverter was obtained through holes in the current directly reaching the cathode via the p+ divert region and the p+ cathode layer beneath the n+ cathode layer.
Original language | English |
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Pages (from-to) | 749-753 |
Number of pages | 5 |
Journal | Microelectronics Journal |
Volume | 32 |
Issue number | 9 |
DOIs | |
Publication status | Published - 2001 Sept |
Keywords
- Forward blocking voltage
- Latch-up
- Power integrated circuit
- Turn-off
- p+ Divert structure
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering