Soft lithography of graphene sheets via surface energy modification

Hansun Kim; Min Wook Jung; Sung Myung; Daesung Jung; Sun Sook Lee; Ki Jeong Kong; Jongsun Lim; Jong Heun Lee; Chong Yun Park; Ki Seok An

doi:10.1039/c2tc00472k

Soft lithography of graphene sheets via surface energy modification

Hansun Kim
, Min Wook Jung
, Sung Myung
, Daesung Jung
, Sun Sook Lee
, Ki Jeong Kong
, Jongsun Lim
, Jong Heun Lee
, Chong Yun Park
, Ki Seok An^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.

Original language	English
Pages (from-to)	1076-1079
Number of pages	4
Journal	Journal of Materials Chemistry C
Volume	1
Issue number	6
DOIs	https://doi.org/10.1039/c2tc00472k
Publication status	Published - 2013 Feb 14

ASJC Scopus subject areas

General Chemistry
Materials Chemistry

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10.1039/c2tc00472k

Cite this

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title = "Soft lithography of graphene sheets via surface energy modification",

abstract = "A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.",

author = "Hansun Kim and Jung, \{Min Wook\} and Sung Myung and Daesung Jung and Lee, \{Sun Sook\} and Kong, \{Ki Jeong\} and Jongsun Lim and Lee, \{Jong Heun\} and Park, \{Chong Yun\} and An, \{Ki Seok\}",

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T1 - Soft lithography of graphene sheets via surface energy modification

AU - Kim, Hansun

AU - Jung, Min Wook

AU - Myung, Sung

AU - Jung, Daesung

AU - Lee, Sun Sook

AU - Kong, Ki Jeong

AU - Lim, Jongsun

AU - Lee, Jong Heun

AU - Park, Chong Yun

AU - An, Ki Seok

PY - 2013/2/14

Y1 - 2013/2/14

N2 - A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.

AB - A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.

UR - https://www.scopus.com/pages/publications/84876937941

U2 - 10.1039/c2tc00472k

DO - 10.1039/c2tc00472k

M3 - Article

AN - SCOPUS:84876937941

SN - 2050-7534

VL - 1

SP - 1076

EP - 1079

JO - Journal of Materials Chemistry C

JF - Journal of Materials Chemistry C

IS - 6

ER -

Soft lithography of graphene sheets via surface energy modification

Abstract

ASJC Scopus subject areas

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