Space-charge-limited injection in n⁺-i-n⁺ structures fabricated by a focused ion beam

Keyphrases

• Focused Ion Beam 100%
• Space Charge Limited 100%
• Wafer 50%
• Transport Characteristics 50%
• I-V Characteristics 50%
• Current-voltage (I-V) Characteristics 50%
• 2-dimensional Electron Gas (2DEG) 50%
• GaAs-AlGaAs 50%
• Flat Band 50%
• Highly Linear 50%
• Charged Defects 50%
• Defect Density 50%
• Line Scan 50%
• Single Line 50%

Engineering

• Current-Voltage Characteristic 100%
• Space Charge 100%
• Focused Ion Beam 100%
• Two Dimensional 50%
• Gallium Arsenide 50%
• Aluminium Gallium Arsenide 50%
• Defect Density 50%
• Single Line 50%

Material Science

• Current-Voltage Characteristic 100%
• Focused Ion Beam 100%
• Gallium Arsenide 50%
• Aluminium Gallium Arsenide 50%
• Defect Density 50%