Abstract
Deep trap spectra in AlGaN/GaN high electron mobility transistor (HEMT) structures were studied by capacitance deep level transient spectroscopy. A major trap with an ionization level near Ec-0.6 eV was detected and attributed to states in the GaN buffer close to the AlGaN interface. These states have a signature very similar to the previously reported traps in AlGaN/GaN HEMTs responsible for the device degradation under electric stress.
Original language | English |
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Article number | 050602 |
Journal | Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics |
Volume | 32 |
Issue number | 5 |
DOIs | |
Publication status | Published - 2014 Sept 1 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Instrumentation
- Process Chemistry and Technology
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
- Materials Chemistry