Specific contact resistivity reduction through Ar plasma-treated TiO2-x interfacial layer to metal/Ge contact

  • Gwang Sik Kim*
  • , Jeong Kyu Kim
  • , Seung Hwan Kim
  • , Jaesung Jo
  • , Changhwan Shin
  • , Jin Hong Park
  • , Krishna C. Saraswat
  • , Hyun Yong Yu
    • *Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

40 Citations (Scopus)

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Keyphrases

Material Science

Engineering