Abstract
Discovery of low-dimensional materials has been of great interest in physics and material science. Optical permittivity is an optical fingerprint of material electronic structures, and thus it is an important parameter in the study of the properties of materials. Spectroscopic ellipsometry provides a fast, robust, and noninvasive method for obtaining the optical permittivity spectra of newly discovered materials. Atomically thin low-dimensional materials have an extremely short vertical optical path length inside them, making the spectroscopic ellipsometry of low-dimensional materials unique, compared to traditional ellipsometry. Here, we introduce the fundamentals of spectroscopic ellipsometry for two-dimensional (2D) materials and review recent progress. We also discuss technical challenges and future directions in spectroscopic ellipsometry for low-dimensional materials.
| Original language | English |
|---|---|
| Pages (from-to) | 2811-2825 |
| Number of pages | 15 |
| Journal | Nanophotonics |
| Volume | 11 |
| Issue number | 12 |
| DOIs | |
| Publication status | Published - 2022 Jun 1 |
Bibliographical note
Funding Information:Research funding: This work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (NRF-2019R1A4A1028121, 2021R1A2C2008814)
Publisher Copyright:
© 2022 SeokJae Yoo and Q-Han Park, published by De Gruyter, Berlin/Boston.
Keywords
- electronic structures
- ellipsometry
- low dimensional materials
- permittivity
- spectroscopy
- van der Waals materials
ASJC Scopus subject areas
- Biotechnology
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering