Spontaneous registration of Sub-10 nm features based on subzero celsius spin-casting of self-assembling building blocks directed by chemically encoded surfaces

Jung Hye Lee; Hak Jong Choi; Chulhee Lee; Seung Won Song; Joong Bum Lee; Daihong Huh; Yoon Sung Nam; Duk Young Jeon; Heon Lee; Yeon Sik Jung

doi:10.1021/acsnano.8b03378

Spontaneous registration of Sub-10 nm features based on subzero celsius spin-casting of self-assembling building blocks directed by chemically encoded surfaces

Jung Hye Lee, Hak Jong Choi, Chulhee Lee, Seung Won Song, Joong Bum Lee, Daihong Huh, Yoon Sung Nam, Duk Young Jeon, Heon Lee, Yeon Sik Jung

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

For low-cost and facile fabrication of innovative nanoscale devices with outstanding functionality and performance, it is critical to develop more practical patterning solutions that are applicable to a wide range of materials and feature sizes while minimizing detrimental effects by processing conditions. In this study, we report that area-selective sub-10 nm pattern formation can be realized by temperature-controlled spin-casting of block copolymers (BCPs) combined with submicron-scale-patterned chemical surfaces. Compared to conventional room-temperature spin-casting, the low temperature (e.g.,-5 °C) casting of the BCP solution on the patterned self-assembled monolayer achieved substantially improved area selectivity and uniformity, which can be explained by optimized solvent evaporation kinetics during the last stage of film formation. Moreover, the application of cold spin-casting can also provide high-yield in situ patterning of light-emitting CdSe/ZnS quantum dot thin films, indicating that this temperature-optimized spin-casting strategy would be highly effective for tailored patterning of diverse organic and hybrid materials in solution phase.

Original language	English
Pages (from-to)	8224-8233
Number of pages	10
Journal	ACS nano
Volume	12
Issue number	8
DOIs	https://doi.org/10.1021/acsnano.8b03378
Publication status	Published - 2018 Aug 28

Bibliographical note

Funding Information:
This research was supported by Creative Materials Discovery Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (NRF-2016M3D1A1900035). This research was supported by the Pioneer Research Center Program through the National Research Foundation of Korea funded by the Ministry of Science, ICT & Future Planning (NRF-2013M3C1A3063046). This work was also supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (NRF-2017R1A2B2009948). The authors also acknowledge Pohang Accelerator Laboratory for grazing-incidence small-angle X-ray scattering measurements.

Publisher Copyright:
© 2018 American Chemical Society.

Keywords

block copolymers
cold spin-casting
quantum dots
self-assembled monolayer
spontaneous registration

ASJC Scopus subject areas

General Materials Science
General Engineering
General Physics and Astronomy

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10.1021/acsnano.8b03378

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title = "Spontaneous registration of Sub-10 nm features based on subzero celsius spin-casting of self-assembling building blocks directed by chemically encoded surfaces",

abstract = "For low-cost and facile fabrication of innovative nanoscale devices with outstanding functionality and performance, it is critical to develop more practical patterning solutions that are applicable to a wide range of materials and feature sizes while minimizing detrimental effects by processing conditions. In this study, we report that area-selective sub-10 nm pattern formation can be realized by temperature-controlled spin-casting of block copolymers (BCPs) combined with submicron-scale-patterned chemical surfaces. Compared to conventional room-temperature spin-casting, the low temperature (e.g.,-5 °C) casting of the BCP solution on the patterned self-assembled monolayer achieved substantially improved area selectivity and uniformity, which can be explained by optimized solvent evaporation kinetics during the last stage of film formation. Moreover, the application of cold spin-casting can also provide high-yield in situ patterning of light-emitting CdSe/ZnS quantum dot thin films, indicating that this temperature-optimized spin-casting strategy would be highly effective for tailored patterning of diverse organic and hybrid materials in solution phase.",

keywords = "block copolymers, cold spin-casting, quantum dots, self-assembled monolayer, spontaneous registration",

author = "Lee, {Jung Hye} and Choi, {Hak Jong} and Chulhee Lee and Song, {Seung Won} and Lee, {Joong Bum} and Daihong Huh and Nam, {Yoon Sung} and Jeon, {Duk Young} and Heon Lee and Jung, {Yeon Sik}",

note = "Funding Information: This research was supported by Creative Materials Discovery Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (NRF-2016M3D1A1900035). This research was supported by the Pioneer Research Center Program through the National Research Foundation of Korea funded by the Ministry of Science, ICT & Future Planning (NRF-2013M3C1A3063046). This work was also supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MSIT) (NRF-2017R1A2B2009948). The authors also acknowledge Pohang Accelerator Laboratory for grazing-incidence small-angle X-ray scattering measurements. Publisher Copyright: {\textcopyright} 2018 American Chemical Society.",

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AU - Choi, Hak Jong

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AU - Song, Seung Won

AU - Lee, Joong Bum

AU - Huh, Daihong

AU - Nam, Yoon Sung

AU - Jeon, Duk Young

AU - Lee, Heon

AU - Jung, Yeon Sik

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PY - 2018/8/28

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N2 - For low-cost and facile fabrication of innovative nanoscale devices with outstanding functionality and performance, it is critical to develop more practical patterning solutions that are applicable to a wide range of materials and feature sizes while minimizing detrimental effects by processing conditions. In this study, we report that area-selective sub-10 nm pattern formation can be realized by temperature-controlled spin-casting of block copolymers (BCPs) combined with submicron-scale-patterned chemical surfaces. Compared to conventional room-temperature spin-casting, the low temperature (e.g.,-5 °C) casting of the BCP solution on the patterned self-assembled monolayer achieved substantially improved area selectivity and uniformity, which can be explained by optimized solvent evaporation kinetics during the last stage of film formation. Moreover, the application of cold spin-casting can also provide high-yield in situ patterning of light-emitting CdSe/ZnS quantum dot thin films, indicating that this temperature-optimized spin-casting strategy would be highly effective for tailored patterning of diverse organic and hybrid materials in solution phase.

AB - For low-cost and facile fabrication of innovative nanoscale devices with outstanding functionality and performance, it is critical to develop more practical patterning solutions that are applicable to a wide range of materials and feature sizes while minimizing detrimental effects by processing conditions. In this study, we report that area-selective sub-10 nm pattern formation can be realized by temperature-controlled spin-casting of block copolymers (BCPs) combined with submicron-scale-patterned chemical surfaces. Compared to conventional room-temperature spin-casting, the low temperature (e.g.,-5 °C) casting of the BCP solution on the patterned self-assembled monolayer achieved substantially improved area selectivity and uniformity, which can be explained by optimized solvent evaporation kinetics during the last stage of film formation. Moreover, the application of cold spin-casting can also provide high-yield in situ patterning of light-emitting CdSe/ZnS quantum dot thin films, indicating that this temperature-optimized spin-casting strategy would be highly effective for tailored patterning of diverse organic and hybrid materials in solution phase.

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Spontaneous registration of Sub-10 nm features based on subzero celsius spin-casting of self-assembling building blocks directed by chemically encoded surfaces

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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