Abstract
We have studied the morphological evolution of Ni(1 1 0) surface induced by low-energy ion sputtering at room temperature with scanning tunneling microscopy. We found that there are two different time regimes in the sputtering processes. In the first regime, a ripple structure is formed with the wave vector along the direction [1 1̄ 0] due to the strong diffusion bias along the direction and the surface roughness increases fast with time. However, in the second regime, three-dimensional mounds are formed with absent anisotropy and the logarithmic surface roughness becomes saturated.
Original language | English |
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Pages (from-to) | 76-79 |
Number of pages | 4 |
Journal | Applied Surface Science |
Volume | 183 |
Issue number | 1-2 |
DOIs | |
Publication status | Published - 2001 Nov 12 |
Externally published | Yes |
Keywords
- Ion sputtering
- Scanning tunneling microscopy
- Sputter-erosion
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films